nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
A macro model of silicon spiral inductor
|
Su, C.Y. |
|
2002 |
46 |
5 |
p. 759-767 9 p. |
artikel |
2 |
A model for exciton formation in organic electroluminescent devices
|
Kwok, H.L. |
|
2002 |
46 |
5 |
p. 645-650 6 p. |
artikel |
3 |
An accurate charge control model for spontaneous and piezoelectric polarization dependent two-dimensional electron gas sheet charge density of lattice-mismatched AlGaN/GaN HEMTs
|
Rashmi, |
|
2002 |
46 |
5 |
p. 621-630 10 p. |
artikel |
4 |
Analysis of the diode characteristics using the thermodynamic theories
|
Maa, Yann Jiun |
|
2002 |
46 |
5 |
p. 735-742 8 p. |
artikel |
5 |
A review of SiC static induction transistor development for high-frequency power amplifiers
|
Sung, Y.M. |
|
2002 |
46 |
5 |
p. 605-613 9 p. |
artikel |
6 |
Bulk-limited conduction of Ge-implanted thermally grown SiO2 layers
|
Zhao, J |
|
2002 |
46 |
5 |
p. 661-664 4 p. |
artikel |
7 |
Current–voltage characteristics of an integrated Schottky diode
|
Tarplee, M |
|
2002 |
46 |
5 |
p. 753-757 5 p. |
artikel |
8 |
DC and microwave performance of recessed-gate GaN MESFETs using ICP-RIE
|
Lee, C |
|
2002 |
46 |
5 |
p. 743-746 4 p. |
artikel |
9 |
De-embedding length-dependent edge-leakage current in shallow trench isolation submicron MOSFETs
|
Zhou, X |
|
2002 |
46 |
5 |
p. 769-772 4 p. |
artikel |
10 |
Development of advanced plasma process with an optical emission spectroscopy-based end-point technique for etching of AlGaAs over GaAs in manufacture of heterojunction bipolar transistors
|
Lee, J.W. |
|
2002 |
46 |
5 |
p. 773-775 3 p. |
artikel |
11 |
Device simulation of surface quantization effect on MOSFETs with simplified density-gradient method
|
Matsuzawa, Kazuya |
|
2002 |
46 |
5 |
p. 747-751 5 p. |
artikel |
12 |
Effect of plasma enhanced chemical vapor deposition of SiN x on n-GaN Schottky rectifiers
|
Luo, B. |
|
2002 |
46 |
5 |
p. 705-710 6 p. |
artikel |
13 |
Electric field effects associated with the backside Ge profile in SiGe HBTs
|
Zhang, Gang |
|
2002 |
46 |
5 |
p. 655-659 5 p. |
artikel |
14 |
Extraction of Schottky diode parameters including parallel conductance using a vertical optimization method
|
Ferhat-Hamida, A. |
|
2002 |
46 |
5 |
p. 615-619 5 p. |
artikel |
15 |
Fabrication of AlGaN/GaN heterostructure field effect transistor using room-temperature ohmic contact
|
Jeon, Chang Min |
|
2002 |
46 |
5 |
p. 695-698 4 p. |
artikel |
16 |
Field programmable spin-logic realized with tunnelling-magnetoresistance devices
|
Richter, R. |
|
2002 |
46 |
5 |
p. 639-643 5 p. |
artikel |
17 |
Finite difference analysis of thermal characteristics of CW operation 850 nm lateral current injection and implant-apertured VCSEL with flip-chip bond design
|
Mehandru, R. |
|
2002 |
46 |
5 |
p. 699-704 6 p. |
artikel |
18 |
Morphological study of the Al–Ti ohmic contact to p-type SiC
|
Mohney, S.E. |
|
2002 |
46 |
5 |
p. 689-693 5 p. |
artikel |
19 |
Optimization of gas flow and etch depth uniformity for plasma etching of large area GaAs wafers
|
Lee, J.W. |
|
2002 |
46 |
5 |
p. 685-688 4 p. |
artikel |
20 |
Reduction of dark current in an n-type In0.3Ga0.7As/GaAs quantum well infrared photodetector by using a camel diode structure
|
Park, Jinsung |
|
2002 |
46 |
5 |
p. 651-654 4 p. |
artikel |
21 |
Scaling of pseudomorphic high electron mobility transistors to decanano dimensions
|
Kalna, K. |
|
2002 |
46 |
5 |
p. 631-638 8 p. |
artikel |
22 |
Study on ZnSnO3 sensitive material based on combustible gases
|
Wu, Xing-Hui |
|
2002 |
46 |
5 |
p. 715-719 5 p. |
artikel |
23 |
Substrate-triggered ESD clamp devices for use in power-rail ESD clamp circuits
|
Ker, Ming-Dou |
|
2002 |
46 |
5 |
p. 721-734 14 p. |
artikel |
24 |
The effects of scaling on the performance of small-signal MOS amplifiers
|
Fiegna, Claudio |
|
2002 |
46 |
5 |
p. 675-683 9 p. |
artikel |
25 |
The influence of geometric structure on the hot-carrier-effect immunity for deep-sub-micron grooved gate PMOSFET
|
Ren, Hongxia |
|
2002 |
46 |
5 |
p. 665-673 9 p. |
artikel |
26 |
Transient response of highly doped thin channel GaN metal–semiconductor and metal-oxide–semiconductor field effect transistors
|
Pala, N. |
|
2002 |
46 |
5 |
p. 711-714 4 p. |
artikel |