no |
title |
author |
magazine |
year |
volume |
issue |
page(s) |
type |
1 |
A general bulk-limited transport analysis of a 10 nm-thick oxide stress-induced leakage current
|
De Salvo, B. |
|
2000 |
44 |
6 |
p. 895-903 9 p. |
article |
2 |
A Gummel–Poon model for pnp heterojunction bipolar transistors with a compositionally graded base
|
Datta, S. |
|
2000 |
44 |
6 |
p. 991-1000 10 p. |
article |
3 |
An accurate relationship for determining the key parameters of MOSFETs by proportional difference operator method
|
Wang, Jinyan |
|
2000 |
44 |
6 |
p. 959-962 4 p. |
article |
4 |
A novel approach to charge-based non-quasi-static model of the MOS transistor valid in all modes of operation
|
Sallese, J.M. |
|
2000 |
44 |
6 |
p. 887-894 8 p. |
article |
5 |
A novel resonant tunneling base transistor with bi-directional negative-differential-resistance phenomena
|
Tsai, Jung-Hui |
|
2000 |
44 |
6 |
p. 1049-1053 5 p. |
article |
6 |
A simulation study on the DC characteristics of the Ga0.52In0.48P/In0.2Ga0.8As/Ga0.52In0.48P double heterojunction pseudomorphic high electron mobility transistor
|
Yoon, S.F |
|
2000 |
44 |
6 |
p. 1035-1042 8 p. |
article |
7 |
Aspect ratio calculation in n-channel MOSFETs with a gate-enclosed layout
|
Giraldo, A |
|
2000 |
44 |
6 |
p. 981-989 9 p. |
article |
8 |
Channel and well design of quarter-micron high performance retrograde well pMOSFETs
|
Toe-Naing, Swe |
|
2000 |
44 |
6 |
p. 1121-1125 5 p. |
article |
9 |
Characteristics of an epitaxial Schottky barrier diode for all levels of injection
|
Hassan, M.M.Shahidul |
|
2000 |
44 |
6 |
p. 1111-1116 6 p. |
article |
10 |
Charge retention of scaled SONOS nonvolatile memory devices at elevated temperatures
|
Yang, Yang (Larr) |
|
2000 |
44 |
6 |
p. 949-958 10 p. |
article |
11 |
Circuit model for traveling wave semiconductor laser amplifiers
|
Chen, Weiyou |
|
2000 |
44 |
6 |
p. 1009-1012 4 p. |
article |
12 |
Complex random telegraph signals in 0.06 μm2 MDD n-MOSFETs
|
Amarasinghe, Nuditha Vibhavie |
|
2000 |
44 |
6 |
p. 1013-1019 7 p. |
article |
13 |
Conditions of ion implantation into thin amorphous Si gate layers for suppressing threshold voltage shift
|
Suzuki, Kunihiro |
|
2000 |
44 |
6 |
p. 1043-1047 5 p. |
article |
14 |
Device parameters extracted in the linear region of MOSFET by comparing with the exact gradual channel model
|
Katto, Hisao |
|
2000 |
44 |
6 |
p. 969-976 8 p. |
article |
15 |
Effects of thin oxide in metal–semiconductor and metal–insulator–semiconductor epi-GaAs Schottky diodes
|
Hudait, Mantu Kumar |
|
2000 |
44 |
6 |
p. 1089-1097 9 p. |
article |
16 |
Electrical characterization of Si/Si1−x Ge x /Si quantum well heterostructures using a MOS capacitor
|
Maikap, S. |
|
2000 |
44 |
6 |
p. 1029-1034 6 p. |
article |
17 |
Evaluation of transport properties of ozonized poly/mono interfaces in polysilicon emitter bipolar transistors
|
Niel, S. |
|
2000 |
44 |
6 |
p. 963-967 5 p. |
article |
18 |
Germanium junction field effect transistor for cryogenic applications
|
Das, N.C |
|
2000 |
44 |
6 |
p. 937-940 4 p. |
article |
19 |
Graded-channel fully depleted Silicon-On-Insulator nMOSFET for reducing the parasitic bipolar effects
|
Pavanello, Marcelo Antonio |
|
2000 |
44 |
6 |
p. 917-922 6 p. |
article |
20 |
Grain and grain-boundary control of the transfer characteristics of large-grain polycrystalline silicon thin-film transistors
|
Farmakis, F.V |
|
2000 |
44 |
6 |
p. 913-916 4 p. |
article |
21 |
Hot carrier reliability characteristics of a bend-gate MOSFET
|
Lee, Woosung |
|
2000 |
44 |
6 |
p. 1117-1119 3 p. |
article |
22 |
Impact of gate workfunction on device performance at the 50 nm technology node
|
De, Indranil |
|
2000 |
44 |
6 |
p. 1077-1080 4 p. |
article |
23 |
Improved analytical modeling of polysilicon depletion in MOSFETs for circuit simulation
|
Sallese, Jean-Michel |
|
2000 |
44 |
6 |
p. 905-912 8 p. |
article |
24 |
Large-signal microwave performance of GaN-based NDR diode oscillators
|
Alekseev, Egor |
|
2000 |
44 |
6 |
p. 941-947 7 p. |
article |
25 |
Levelized incomplete LU method and its application to semiconductor device simulation
|
Tsai, Yao-Tsung |
|
2000 |
44 |
6 |
p. 1069-1075 7 p. |
article |
26 |
Luminescence of an InGaN/GaN multiple quantum well light-emitting diode
|
Sheu, J.K |
|
2000 |
44 |
6 |
p. 1055-1058 4 p. |
article |
27 |
Magnetoelectronic latching Boolean gate
|
Johnson, Mark |
|
2000 |
44 |
6 |
p. 1099-1104 6 p. |
article |
28 |
Proportional difference operator method and its application in studying subthreshold behavior of MOSFETs
|
Tan, Changhua |
|
2000 |
44 |
6 |
p. 1059-1067 9 p. |
article |
29 |
Stress-induced high-field gate leakage current in ultra-thin gate oxide
|
Wei, Jianlin |
|
2000 |
44 |
6 |
p. 977-980 4 p. |
article |
30 |
Technology CAD based statistical simulation of MOSFETs
|
Shigyo, Naoyuki |
|
2000 |
44 |
6 |
p. 1001-1007 7 p. |
article |
31 |
The formation of stable ohmic contacts to MBE grown CdTe layers
|
Yousaf, M |
|
2000 |
44 |
6 |
p. 923-927 5 p. |
article |
32 |
The indium content in metamorphic In x Al 1−x As/ In x Ga 1−x As HEMTs on GaAs substrate: a new structure parameter
|
Bollaert, S. |
|
2000 |
44 |
6 |
p. 1021-1027 7 p. |
article |
33 |
The integration of high-side and low-side LIGBTs on partial silicon-on-insulator
|
Garner, D.M |
|
2000 |
44 |
6 |
p. 929-935 7 p. |
article |
34 |
Transconductance of large grain excimer laser-annealed polycrystalline silicon thin film transistors
|
Angelis, C.T. |
|
2000 |
44 |
6 |
p. 1081-1087 7 p. |
article |
35 |
Verification of overlap and fringing capacitance models for MOSFETs
|
Wakita, Naoki |
|
2000 |
44 |
6 |
p. 1105-1109 5 p. |
article |