nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
A compact CAD model for amorphous silicon thin film transistors simulation—I. d.c. analysis
|
Merckel, G. |
|
1996 |
39 |
8 |
p. 1231-1239 9 p. |
artikel |
2 |
A compact CAD model for amorphous silicon thin film transistors simulation—II. Transient non-quasi-static analysis
|
Merckel, G. |
|
1996 |
39 |
8 |
p. 1241-1245 5 p. |
artikel |
3 |
An analytical model of the breakdown voltage and minimum epi layer length for RESURF pn diodes
|
Han, Seung-Youp |
|
1996 |
39 |
8 |
p. 1247-1248 2 p. |
artikel |
4 |
A simple d.c. based method for monitoring transistor capacitance
|
Joardar, K. |
|
1996 |
39 |
8 |
p. 1193-1198 6 p. |
artikel |
5 |
A two-dimensional analytical model of homojunction GaAs BMFET structures
|
Bellone, S. |
|
1996 |
39 |
8 |
p. 1221-1229 9 p. |
artikel |
6 |
A velocity-overshoot capacitance model for 0.1 μm MOS transistors
|
Kuo, J.B. |
|
1996 |
39 |
8 |
p. 1173-1178 6 p. |
artikel |
7 |
Characteristics of functional heterostructure-emitter bipolar transistors (HEBTs)
|
Thei, Kong-Beng |
|
1996 |
39 |
8 |
p. 1137-1142 6 p. |
artikel |
8 |
Contactless characterization of the recombination process in silicon wafers: Separation between bulk and surface contribution
|
Bernini, R. |
|
1996 |
39 |
8 |
p. 1165-1172 8 p. |
artikel |
9 |
C-V and G-V characterization of in-situ fabricated Ga2O3GaAs interfaces for inversion/accumulation device and surface passivation applications
|
Passlack, M. |
|
1996 |
39 |
8 |
p. 1133-1136 4 p. |
artikel |
10 |
Electron drift velocity versus electric field in III–V semiconductors
|
Majumdar, Amlan |
|
1996 |
39 |
8 |
p. 1251-1252 2 p. |
artikel |
11 |
Expressions for the chemical potential in metals and other highly degenerate materials
|
Chua, Chris L. |
|
1996 |
39 |
8 |
p. 1249-1250 2 p. |
artikel |
12 |
Growth and characterization of AlGaAs GaAs heterojunction bipolar transistor on GaAs (111)B substrate by molecular beam epitaxy
|
Lee, Tsuen-Lin |
|
1996 |
39 |
8 |
p. 1127-1132 6 p. |
artikel |
13 |
Hydrodynamic device simulation using new state variables tailored for a block Gummel iterative approach
|
Liang, Wenchao |
|
1996 |
39 |
8 |
p. 1213-1220 8 p. |
artikel |
14 |
Ion implantation and secondary ion mass spectrometry of compound semiconductors
|
Wilson, R.G. |
|
1996 |
39 |
8 |
p. 1113-1125 13 p. |
artikel |
15 |
Low-temperature impurity breakdown in semiconductors: An approach towards efficient device simulation
|
Kunz, R.E. |
|
1996 |
39 |
8 |
p. 1155-1164 10 p. |
artikel |
16 |
Numerical analysis of a new vertical IGBT structure with reduced JFET effect
|
Yun, Chong-Man |
|
1996 |
39 |
8 |
p. 1179-1183 5 p. |
artikel |
17 |
Numerical simulation of transconductance in Si SiGe p-MOSFETs
|
Sadovnikov, A.D. |
|
1996 |
39 |
8 |
p. 1199-1203 5 p. |
artikel |
18 |
Optimizing high voltage bipolar transistors in a smart-power complementary BiCMOS technology
|
Ryter, R. |
|
1996 |
39 |
8 |
p. 1185-1191 7 p. |
artikel |
19 |
Study of 1 f noise in InP grown by CBE
|
Chen, X.Y. |
|
1996 |
39 |
8 |
p. 1149-1153 5 p. |
artikel |
20 |
Temperature dependence confirmation of tunneling through 2–6 nm silicon dioxide
|
Lundgren, P. |
|
1996 |
39 |
8 |
p. 1143-1147 5 p. |
artikel |
21 |
Time of flight analysis of charge transport in insulators for a finite width charge packet with trapping
|
Mirchina, N.R. |
|
1996 |
39 |
8 |
p. 1205-1211 7 p. |
artikel |