nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
A hydrodynamic transport model and its applications in semiconductor device simulation
|
Zhang, Yaxi |
|
1993 |
36 |
12 |
p. 1689-1696 8 p. |
artikel |
2 |
AlAs/GaAs Schottky-collector resonant-tunnel-diodes
|
Konishi, Y. |
|
1993 |
36 |
12 |
p. 1673-1676 4 p. |
artikel |
3 |
A note on the Shukla-Sen drift velocity model for hot charge carriers in Ge and Si
|
Roy, D.K. |
|
1993 |
36 |
12 |
p. 1795-1796 2 p. |
artikel |
4 |
A study of selective and nonselective reactive ion etching of GaAs/AlGaAs materials
|
Su, Y.K. |
|
1993 |
36 |
12 |
p. 1779-1785 7 p. |
artikel |
5 |
Breakdown voltage of high-voltage GaAs Schottky diodes
|
Ashkinazi, G. |
|
1993 |
36 |
12 |
p. 1793-1794 2 p. |
artikel |
6 |
Diffusion from zinc-doped spin-on sources into n-gallium antimonide
|
Heinz, C. |
|
1993 |
36 |
12 |
p. 1685-1688 4 p. |
artikel |
7 |
Direct bonding of GaAs films on silicon circuits by epitaxial liftoff
|
Ersen, Ali |
|
1993 |
36 |
12 |
p. 1731-1739 9 p. |
artikel |
8 |
Editorial: Software survey section
|
|
|
1993 |
36 |
12 |
p. I-III nvt p. |
artikel |
9 |
Editors' biographies
|
|
|
1993 |
36 |
12 |
p. v- 1 p. |
artikel |
10 |
Electrical studies of the reactions between ethanol vapours and inversion mode Si-thin SiO2 structures
|
Atanassova, E. |
|
1993 |
36 |
12 |
p. 1711-1716 6 p. |
artikel |
11 |
Equivalent analytical solution for the minority carrier transport in doped silicon
|
Abenante, Luigi |
|
1993 |
36 |
12 |
p. 1797-1800 4 p. |
artikel |
12 |
Investigation of Se-doped GaSb epilayers grown by low pressure metal-organic chemical vapor deposition
|
Su, Y.K. |
|
1993 |
36 |
12 |
p. 1773-1778 6 p. |
artikel |
13 |
List of contents and author index
|
|
|
1993 |
36 |
12 |
p. i-xxiv nvt p. |
artikel |
14 |
Low temperature impurity diffusion in SiC: Planar quantum-size p-n junctions and n-p-n transistor structures
|
Bagraev, N.T. |
|
1993 |
36 |
12 |
p. 1741-1747 7 p. |
artikel |
15 |
Modeling the effect of back gate bias on the subthreshold behavior of a SiGe-channel SOI PMOS device
|
Kuo, J.B. |
|
1993 |
36 |
12 |
p. 1757-1761 5 p. |
artikel |
16 |
MOSFET effective channel width determination by nonlinear optimization
|
McAndrew, Colin C. |
|
1993 |
36 |
12 |
p. 1717-1723 7 p. |
artikel |
17 |
New boundary conditions for the simulation of Schottky structure characteristics
|
Racko, J. |
|
1993 |
36 |
12 |
p. 1790-1792 3 p. |
artikel |
18 |
On the characterization of surface states and deep traps in GaAs MESFETs
|
Zhao, J.H. |
|
1993 |
36 |
12 |
p. 1665-1672 8 p. |
artikel |
19 |
Process and device characterization of high voltage gallium arsenide P-i-N layers grown by an improved liquid phase epitaxy method
|
Ashkinazi, G. |
|
1993 |
36 |
12 |
p. 1749-1755 7 p. |
artikel |
20 |
Strain effects on device characteristics: Implementation in drift-diffusion simulators
|
Egley, J.L. |
|
1993 |
36 |
12 |
p. 1653-1664 12 p. |
artikel |
21 |
Temperature, electric field, and doping dependent mobilities of electrons and holes in semiconductors
|
Noor Mohammad, S. |
|
1993 |
36 |
12 |
p. 1677-1683 7 p. |
artikel |
22 |
Theoretical calculation and experimental evidence of the real and apparent bandgap narrowing due to heavy doping in p-type Si and strained Si1−x Ge x layers
|
Poortmans, J. |
|
1993 |
36 |
12 |
p. 1763-1771 9 p. |
artikel |
23 |
The temperature and current profiles in an emitter finger as a function of the finger length
|
Liu, William |
|
1993 |
36 |
12 |
p. 1787-1789 3 p. |
artikel |
24 |
Thin oxide grown on heavily channel-implanted substrate by using a low temperature wafer loading and N2 pre-annealing process
|
Shye Lin Wu, |
|
1993 |
36 |
12 |
p. 1725-1730 6 p. |
artikel |
25 |
Transport via the Liouville equation and moments of quantum distribution functions
|
Grubin, H.L. |
|
1993 |
36 |
12 |
p. 1697-1709 13 p. |
artikel |
26 |
W. Crawford Dunlap
|
|
|
1993 |
36 |
12 |
p. iii- 1 p. |
artikel |