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                             23 results found
no title author magazine year volume issue page(s) type
1 A contactless minority lifetime probe of heterostructures, surfaces, interfaces and bulk wafers Yablonovitch, E.
1992
35 3 p. 261-267
7 p.
article
2 Admittance spectroscopy in junctions Barbolla, J.
1992
35 3 p. 285-297
13 p.
article
3 An experimental comparison of measurement techniques to extract Si-SiO2 interface trap density Witczak, Steven C.
1992
35 3 p. 345-355
11 p.
article
4 An improved feedback circuit for constant-capacitance voltage transient measurements Kolev, Plamen
1992
35 3 p. 387-389
3 p.
article
5 A study of carrier lifetime in silicon by laser-induced absorption: A perpendicular geometry measurement Grivickas, V.
1992
35 3 p. 299-310
12 p.
article
6 BiMOS and SMOSC structures for MOS parameter measurement Nishida, Toshikazu
1992
35 3 p. 357-369
13 p.
article
7 C-mode acoustic microscopy applied to integrated circuit package inspection Moore, T.M.
1992
35 3 p. 411-421
11 p.
article
8 Contactless nondestructive measurement of bulk and surface recombination using frequency-modulated free carrier absorption Sanii, F.
1992
35 3 p. 311-317
7 p.
article
9 Determination of generation lifetime and interface state density using a pulsed silicon-insulator-silicon capacitor Chen, Hung-Sheng
1992
35 3 p. 371-377
7 p.
article
10 Elimination of effects due to patterning imperfections in electrical test structures for submicrometer feature metrology Allen, R.A.
1992
35 3 p. 435-442
8 p.
article
11 Foreword Pierret, Robert F.
1992
35 3 p. v-
1 p.
article
12 High spatial resolution mapping of resistivity variations in semiconductors Kopanski, J.J.
1992
35 3 p. 423-433
11 p.
article
13 Infrared transmission topography for whole-wafer gallium arsenide materials characterization Mier, M.G.
1992
35 3 p. 319-323
5 p.
article
14 Internal reflection infrared spectroscopy for chemical analysis of surfaces and thin films Burrows, V.A.
1992
35 3 p. 231-238
8 p.
article
15 Measurement considerations for zero-field time-of-flight studies of minority carrier diffusion in III–V semiconductors Lovejoy, M.L.
1992
35 3 p. 251-259
9 p.
article
16 Measurement of minority-carrier lifetime by time-resolved photoluminescence Ahrenkiel, R.K.
1992
35 3 p. 239-250
12 p.
article
17 Measurement of the threshold voltage in MOS capacitors by the equilibrium controlled static C-V method Kerber, M.
1992
35 3 p. 379-385
7 p.
article
18 Minimization of errors in ellipsometric measurements Reisinger, H.
1992
35 3 p. 333-344
12 p.
article
19 Profiling the bandgap-adjusted mobility in a bipolar transistor base using the inverse early effect Fischer, S.E.
1992
35 3 p. 443-446
4 p.
article
20 Submicron metrology in the semiconductor industry Corle, Timothy R.
1992
35 3 p. 391-402
12 p.
article
21 The measurement, use and interpretation of the temperature coefficient of resistance of metallizations Schafft, Harry A.
1992
35 3 p. 403-410
8 p.
article
22 Theory of the photovoltage at semiconductor surfaces and its application to diffusion length measurements Choo, S.C.
1992
35 3 p. 269-283
15 p.
article
23 Ultrahigh-bandwidth vector network analyzer based on external electro-optic sampling Frankel, M.Y.
1992
35 3 p. 325-332
8 p.
article
                             23 results found
 
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