nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
Analysis of gamma-radiation induced instability mechanisms in CMOS transistors
|
Dimitrijev, S. |
|
1989 |
32 |
5 |
p. 349-353 5 p. |
artikel |
2 |
Announcement
|
|
|
1989 |
32 |
5 |
p. I- 1 p. |
artikel |
3 |
Computer simulations of Schottky contacts with a non-constant recombination velocity
|
Nylander, J.O. |
|
1989 |
32 |
5 |
p. 363-367 5 p. |
artikel |
4 |
Editorial - software survey section
|
|
|
1989 |
32 |
5 |
p. III-V nvt p. |
artikel |
5 |
Evidence for formation of low resistance TiSi2 layer with Ti/NSi/Ti/native oxide/PSi (100) stack
|
Singh, Awatar |
|
1989 |
32 |
5 |
p. 413-414 2 p. |
artikel |
6 |
Heterostructure semiconductor device analysis: A globally convergent solution method for the nonlinear poisson equation
|
Tait, Gregory B. |
|
1989 |
32 |
5 |
p. 369-376 8 p. |
artikel |
7 |
Modelling sidewall effects in downscaled bipolar transistors
|
Hurkx, G.A.M. |
|
1989 |
32 |
5 |
p. 397-404 8 p. |
artikel |
8 |
Noise and lifetime measurements in Si p +-i-n power diodes
|
Fang, P. |
|
1989 |
32 |
5 |
p. 345-348 4 p. |
artikel |
9 |
Photo-induced transient spectroscopy PITS study on undoped LEC grown semi-insulating GaAs
|
Fang, Zhaoqiang |
|
1989 |
32 |
5 |
p. 405-411 7 p. |
artikel |
10 |
Photosensitivity of the capacitance of aSiC x :H/P + PcSi heterojunctions
|
Wang, Wanlu |
|
1989 |
32 |
5 |
p. 361-362 2 p. |
artikel |
11 |
Resistivity changes in acceptor doped BaTiO3 due to sintering and annealing in hydrogen containing atmospheres
|
Boser, O. |
|
1989 |
32 |
5 |
p. 377-383 7 p. |
artikel |
12 |
Si/Ti/TiB2/Al structures investigated as contacts in microelectronic devices
|
Larsson, T. |
|
1989 |
32 |
5 |
p. 385-389 5 p. |
artikel |
13 |
Study of bandgap narrowing in the space-charge region of heavily doped silicon MOS capacitors
|
Chen, H.C. |
|
1989 |
32 |
5 |
p. 339-344 6 p. |
artikel |
14 |
The passivation of silicon devices by aSi:H films
|
He, Yuliang |
|
1989 |
32 |
5 |
p. 355-359 5 p. |
artikel |
15 |
Thin-film transistors from very low temperature polycrystalline Si on glass substrates
|
Schmolla, W. |
|
1989 |
32 |
5 |
p. 391-396 6 p. |
artikel |