nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
An electrothermal model for threshold switching in thin amorphous chalcogenide films
|
Shaw, M.P. |
|
1981 |
24 |
3 |
p. 233-248 16 p. |
artikel |
2 |
Behavior of electrically small depletion mode MOSFETs at low temperature
|
Gaensslen, F.H. |
|
1981 |
24 |
3 |
p. 215-220 6 p. |
artikel |
3 |
Deep states in transition metal diffused gallium phosphide
|
Brunwin, R.F. |
|
1981 |
24 |
3 |
p. 249-256 8 p. |
artikel |
4 |
Electronic characterization of double-gate thin film transistors
|
Chen, Inan |
|
1981 |
24 |
3 |
p. 257-261 5 p. |
artikel |
5 |
Field enhanced carrier generation in MOS-capacitors containing defects
|
Werner, C. |
|
1981 |
24 |
3 |
p. 275-279 5 p. |
artikel |
6 |
Localized anodic thinning of GaAs structures
|
Shaw, D.W. |
|
1981 |
24 |
3 |
p. 281-283 3 p. |
artikel |
7 |
Ohmic contacts to Si-implanted InP
|
Yamaguchi, Eiichi |
|
1981 |
24 |
3 |
p. 263-265 3 p. |
artikel |
8 |
Properties of high performance background limited p type Si:Zn photoconductors
|
Sclar, N. |
|
1981 |
24 |
3 |
p. 203-213 11 p. |
artikel |
9 |
Stress-sensitive properties of silicon-gate MOS devices
|
Mikoshiba, Hiroaki |
|
1981 |
24 |
3 |
p. 221-232 12 p. |
artikel |
10 |
Substrate response of a floating gate n-channel MOS memory cell subject to a positive linear ramp voltage
|
Lee, Han-Sheng |
|
1981 |
24 |
3 |
p. 267-273 7 p. |
artikel |
11 |
Third international conference on hot electrons in semiconductors
|
|
|
1981 |
24 |
3 |
p. 285- 1 p. |
artikel |
12 |
Transport equations for the analysis of heavily doped semiconductor devices
|
Lundstrom, M.S. |
|
1981 |
24 |
3 |
p. 195-202 8 p. |
artikel |