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| Titel: |
Laser Nano-Patterning for Large Area Nanostructure Fabrication |
| Auteur: |
Tan, Leng Seow Hong, Minghui |
| Verschenen in: |
International journal of optomechatronics |
| Paginering: | Jaargang 2 (2008) nr. 4 pagina's 382-389 |
| Jaar: |
2008-10 |
| Inhoud: |
The laser nano-patterning technique described here makes use of laser irradiation through a transparent microlens array to generate nano-patterns over a large area in a short time. A femtosecond laser and an excimer laser were used to pattern phase change and photoresist thin films. Due to the ultra-short pulse duration of the femtosecond laser (800 nm/100 fs) and multi-photon absorption effect, nano-patterns down to about 50 nm in feature size were created in the phase change films by laser irradiation at an optimized laser power. By using a 248 nm/23 ns KrF excimer laser, feature sizes of approximately 80 nm can be obtained on a photoresist surface, which implies a high resolution of one third of the laser wavelength. Such small feature size shows that it is possible for the laser nano-patterning technique to overcome the optical diffraction limit for large area surface nano-structuring. |
| Uitgever: |
Taylor & Francis |
| Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
Details van artikel 6 van 12 gevonden artikelen
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