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Soft X-ray varied-line-spacing gratings fabricated by near-field holography using an electron beam lithography-written phase mask |
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Titel: |
Soft X-ray varied-line-spacing gratings fabricated by near-field holography using an electron beam lithography-written phase mask |
Auteur: |
Lin, Dakui Liu, Zhengkun Dietrich, Kay Sokolov, Andréy Sertsu, Mewael Giday Zhou, Hongjun Huo, Tonglin Kroker, Stefanie Chen, Huoyao Qiu, Keqiang Xu, Xiangdong Schäfers, Franz Liu, Ying Kley, Ernst-Bernhard Hong, Yilin |
Verschenen in: |
Journal of synchrotron radiation |
Paginering: |
Jaargang 26 (2019) nr. 5 pagina's 1782-1789 |
Jaar: |
2019-09-01 |
Inhoud: |
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Uitgever: |
International Union of Crystallography, 5 Abbey Square, Chester, Cheshire CH1 2HU, England |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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