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Details for article 40 of 40 found articles
| Title: |
X-ray nanodiffraction analysis of stress oscillations in a W thin film on through-silicon via |
| Author: |
Todt, J. Hammer, H. Sartory, B. Burghammer, M. Kraft, J. Daniel, R. Keckes, J. Defregger, S. |
| Appeared in: |
Journal of applied crystallography |
| Paging: | Volume 49 (2016) nr. 1 pages 182-187 |
| Year: |
2016-02-01 |
| Contents: | |
| Publisher: |
International Union of Crystallography, 5 Abbey Square, Chester, Cheshire CH1 2HU, England |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 40 of 40 found articles
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