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Quantitive analysis of Laue diffraction patterns recorded with a 120 ps exposure from an X-ray undulator |
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Title: |
Quantitive analysis of Laue diffraction patterns recorded with a 120 ps exposure from an X-ray undulator |
Author: |
Szebenyi, D. M. E. Bilderback, D. H. LeGrand, A. Moffat, K. Schildkamp, W. Smith Temple, B. Teng, T. |
Appeared in: |
Journal of applied crystallography |
Paging: |
Volume 25 (1992) nr. 3 pages 414-423 |
Year: |
1992-06-01 |
Contents: |
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Publisher: |
International Union of Crystallography, 5 Abbey Square, Chester, Cheshire CH1 2HU, England |
Source file: |
Elektronische Wetenschappelijke Tijdschriften |
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