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Journal description
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Details for article 66 of 78 found articles
| Title: |
Process characterization and statistical analysis of oxide CMP on a silicon wafer with sparse data |
| Author: |
Bukkapatnam, S.T.S. Rao, P.K. Lih, W.-C. Chandrasekaran, N. Komanduri, R. |
| Appeared in: |
Applied physics. Part A, Materials science and processing |
| Paging: | Volume 88 (2007) nr. 4 pages 785-792 |
| Year: |
2007 |
| Contents: | |
| Publisher: |
Springer-Verlag, Berlin/Heidelberg |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 66 of 78 found articles
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