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Journal description
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Details for article 3 of 10 found articles
| Title: |
Etching of SiC in Low Power Inductively-Coupled Plasma |
| Author: |
Osipov, A. A. Aleksandrov, S. E. Solov’ev, Yu. V. Uvarov, A. A. Osipov, A. A. |
| Appeared in: |
Russian microelectronics |
| Paging: | Volume 47 (2019) nr. 6 pages 427-433 |
| Year: |
2019 |
| Contents: | |
| Publisher: |
Pleiades Publishing, Moscow |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 3 of 10 found articles
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