Nonvolatile memory cells based on the effect of resistive switching in depth-graded ternary HfxAl1 − xOy oxide films
Titel:
Nonvolatile memory cells based on the effect of resistive switching in depth-graded ternary HfxAl1 − xOy oxide films
Auteur:
Orlov, O. M. Chuprik, A. A. Baturin, A. S. Gornev, E. S. Bulakh, K. V. Egorov, K. V. Kuzin, A. A. Negrov, D. V. Zaitsev, S. A. Markeev, A. M. Lebedinskii, Yu. Yu. Zablotskii, A. V.