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Journal description
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Details for article 6 of 10 found articles
| Title: |
Low-temperature pulsed vapor-phase deposition of thin layers of metal ruthenium for micro- and nanoelectronics. Part 5. Interrelation of growth regularities, structure, and properties of ruthenium layers |
| Author: |
Vasilyev, V. Yu. |
| Appeared in: |
Russian microelectronics |
| Paging: | Volume 40 (2011) nr. 6 pages 403-413 |
| Year: |
2011 |
| Contents: | |
| Publisher: |
SP MAIK Nauka/Interperiodica, Dordrecht |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 6 of 10 found articles
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