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Journal description
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Details for article 3 of 16 found articles
| Title: |
Comparative Study of an RF and a Microwave High-Density-Plasma Source for Plasma Immersion Ion Implantation |
| Author: |
S. N. Averkin A. P. Ershov A. A. Orlikovsky K. V. Rudenko Ya. N. Sukhanov |
| Appeared in: |
Russian microelectronics |
| Paging: | Volume 32 (2003) nr. 5 pages 9 p. |
| Year: |
2003-09/10-/10 |
| Contents: | |
| Publisher: |
Kluwer Academic/Plenum Publishers, New York, U.S.A. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 3 of 16 found articles
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