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                                       Details for article 3 of 16 found articles
 
 
  Comparative Study of an RF and a Microwave High-Density-Plasma Source for Plasma Immersion Ion Implantation
 
 
Title: Comparative Study of an RF and a Microwave High-Density-Plasma Source for Plasma Immersion Ion Implantation
Author: S. N. Averkin
A. P. Ershov
A. A. Orlikovsky
K. V. Rudenko
Ya. N. Sukhanov
Appeared in: Russian microelectronics
Paging: Volume 32 (2003) nr. 5 pages 9 p.
Year: 2003-09/10-/10
Contents:
Publisher: Kluwer Academic/Plenum Publishers, New York, U.S.A.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 3 of 16 found articles
 
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