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Journal description
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Details for article 8 of 12 found articles
| Title: |
Reaction Mechanisms in Both a CCl2F2/O2/Ar and a CCl2F2/H2/Ar RF Plasma Environment |
| Author: |
Wang, Ya-Feng Lee, Wen-Jhy Chen, Chuh-Yung Wu, Yo-Ping Greg Chang-Chien, Guo-Ping |
| Appeared in: |
Plasma chemistry and plasma processing |
| Paging: | Volume 20 (2000) nr. 4 pages 469-494 |
| Year: |
2000 |
| Contents: | |
| Publisher: |
Kluwer Academic Publishers-Plenum Publishers, New York |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 8 of 12 found articles
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