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Journal description
All volumes of the corresponding journal
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All articles of the corresponding issues
Details for article 19 of 20 found articles
| Title: |
The effect of He or Ar/O2 plasma treatment on Si surface prior to chemical vapor deposition of SiO2 |
| Author: |
Hyo-Uk Kim Chung Yi Shi-Woo Rhee |
| Appeared in: |
Journal of materials science. Materials in electronics |
| Paging: | Volume 15 (2004) nr. 1 pages 5 p. |
| Year: |
2004-01 |
| Contents: | |
| Publisher: |
Kluwer Academic Publishers, Boston, U.S.A |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 19 of 20 found articles
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