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Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 7 of 10 found articles
| Title: |
High aspect ratio etched sub-micron structures in silicon obtained by cryogenic plasma deep-etching through perforated polymer thin films |
| Author: |
Kulsreshath, M. Vital, A. Lefaucheux, P. Sinturel, C. Tillocher, T. Vayer, M. Boufnichel, M. Dussart, R. |
| Appeared in: |
Micro and nano engineering |
| Paging: | Volume 1 (2018) nr. C pages 42-48 |
| Year: |
2018 |
| Contents: | |
| Publisher: |
The Authors |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 7 of 10 found articles
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