Exploring ultrathin tungsten disulfide as a diffusion barrier for copper interconnects: advanced packaging reliability and a first-principles study
Titel:
Exploring ultrathin tungsten disulfide as a diffusion barrier for copper interconnects: advanced packaging reliability and a first-principles study
Auteur:
Chavan, Vijay D. Lehenkari, Touko Yadav, Suhas Ustad, Ruhan E. Sheikh, Zulfqar Ali Avatare, Ajay T. Kamble, Tushar P. Sajjad, Laraib Komsa, Hannu-Pekka Sabale, Sandip Choi, Kyeong-Keun Park, Seungbae Dastgeer, Ghulam Kim, Honggyun Kim, Deok-kee