Electromigration-Induced Plastic Deformation in Cu Interconnects: Effects on Current Density Exponent, n, and Implications for EM Reliability Assessment
Titel:
Electromigration-Induced Plastic Deformation in Cu Interconnects: Effects on Current Density Exponent, n, and Implications for EM Reliability Assessment
Auteur:
Budiman, A.S. Hau-Riege, C.S. Baek, W.C. Lor, C. Huang, A. Kim, H.S. Neubauer, G. Pak, J. Besser, P.R. Nix, W.D.