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                                       Details for article 29 of 52 found articles
 
 
  In-line monitoring of strain distribution using high resolution X-ray Reciprocal space mapping into 20nm SiGe pMOS
 
 
Title: In-line monitoring of strain distribution using high resolution X-ray Reciprocal space mapping into 20nm SiGe pMOS
Author: Durand, Aurèle
Kaufling, Melissa
Le-Cunff, Delphine
Rouchon, Denis
Gergaud, Patrice
Appeared in: Materials science in semiconductor processing
Paging: Volume 70 (2017) nr. C pages 6 p.
Year: 2017
Contents:
Publisher: Published by Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 29 of 52 found articles
 
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