|
Doping of β-FeSi2 films with boron and arsenic by sputtering and its application for optoelectronic devices |
|
|
|
Titel: |
Doping of β-FeSi2 films with boron and arsenic by sputtering and its application for optoelectronic devices |
Auteur: |
Liu, Zhengxin Osamura, Masato Ootsuka, Teruhisa Wang, Shinan Fukuzawa, Yasuhiro Suzuki, Yasuhito Kuroda, Ryo Mise, Takahiro Otogawa, Naotaka Nakayama, Yasuhiko Tanoue, Hisao Makita, Yunosuke |
Verschenen in: |
Optical materials |
Paginering: |
Jaargang 27 (2005) nr. 5 pagina's 6 p. |
Jaar: |
2005 |
Inhoud: |
|
Uitgever: |
Elsevier B.V. |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
|
|
|
|