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Doping of β-FeSi2 films with boron and arsenic by sputtering and its application for optoelectronic devices |
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Title: |
Doping of β-FeSi2 films with boron and arsenic by sputtering and its application for optoelectronic devices |
Author: |
Liu, Zhengxin Osamura, Masato Ootsuka, Teruhisa Wang, Shinan Fukuzawa, Yasuhiro Suzuki, Yasuhito Kuroda, Ryo Mise, Takahiro Otogawa, Naotaka Nakayama, Yasuhiko Tanoue, Hisao Makita, Yunosuke |
Appeared in: |
Optical materials |
Paging: |
Volume 27 (2005) nr. 5 pages 6 p. |
Year: |
2005 |
Contents: |
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Publisher: |
Elsevier B.V. |
Source file: |
Elektronische Wetenschappelijke Tijdschriften |
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