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Tantalum-doped tin oxide films as an effective diffusion barrier for copper metallization of silicon heterojunction solar cells |
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Titel: |
Tantalum-doped tin oxide films as an effective diffusion barrier for copper metallization of silicon heterojunction solar cells |
Auteur: |
Chen, Kaiyu Yuan, Zhengguo Yue, Xuelin Yi, Dong Li, Yuepeng He, Jialong Ma, Zhu Wang, Weiyan Hu, Yu Xie, Yi Liu, Wenzhu Yu, Jian |
Verschenen in: |
Solar energy materials and solar cells |
Paginering: |
Jaargang 289 () nr. C pagina's p. |
Jaar: |
2025 |
Inhoud: |
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Uitgever: |
Elsevier B.V. |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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