|
Tantalum-doped tin oxide films as an effective diffusion barrier for copper metallization of silicon heterojunction solar cells |
|
|
|
Title: |
Tantalum-doped tin oxide films as an effective diffusion barrier for copper metallization of silicon heterojunction solar cells |
Author: |
Chen, Kaiyu Yuan, Zhengguo Yue, Xuelin Yi, Dong Li, Yuepeng He, Jialong Ma, Zhu Wang, Weiyan Hu, Yu Xie, Yi Liu, Wenzhu Yu, Jian |
Appeared in: |
Solar energy materials and solar cells |
Paging: |
Volume 289 () nr. C pages p. |
Year: |
2025 |
Contents: |
|
Publisher: |
Elsevier B.V. |
Source file: |
Elektronische Wetenschappelijke Tijdschriften |
|
|
|
|