Analysis of low Z elements on Si wafer surfaces with synchrotron radiation induced total reflection X-ray fluorescence at SSRL, Beamline 3-3: comparison of droplets with spin coated wafers
Titel:
Analysis of low Z elements on Si wafer surfaces with synchrotron radiation induced total reflection X-ray fluorescence at SSRL, Beamline 3-3: comparison of droplets with spin coated wafers
Auteur:
Streli, C. Pepponi, G. Wobrauschek, P. Zöger, N. Pianetta, P. Baur, K. Pahlke, S. Fabry, L. Mantler, C. Kanngießer, B. Malzer, W.