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Spectroscopy of highly charged ions for extreme ultraviolet lithography |
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Titel: |
Spectroscopy of highly charged ions for extreme ultraviolet lithography |
Auteur: |
O'Sullivan, Gerry Dunne, Padraig Higashiguchi, Takeshi Kos, Domagoj Maguire, OisÃn Miyazaki, Takanori O'Reilly, Fergal Sheil, John Sokell, Emma Kilbane, Deirdre |
Verschenen in: |
Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms |
Paginering: |
Jaargang 408 (2017) nr. C pagina's 3-8 |
Jaar: |
2017 |
Inhoud: |
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Uitgever: |
Elsevier B.V. |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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