|
Amorphization implants and low temperature rapid thermal processing to form low sheet resistance, shallow junction, boron implanted layers |
|
|
|
Titel: |
Amorphization implants and low temperature rapid thermal processing to form low sheet resistance, shallow junction, boron implanted layers |
Auteur: |
Wilson, S.R. Paulson, W.M. Gregory, R.B. Lamartine, B.C. Leavitt, J.A. McIntyre Jr., L.C. Seerveld, J.L. |
Verschenen in: |
Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms |
Paginering: |
Jaargang 21 (1987) nr. 1-4 pagina's 5 p. |
Jaar: |
1987 |
Inhoud: |
|
Uitgever: |
Published by Elsevier B.V. |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
|
|
|
|