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Amorphization implants and low temperature rapid thermal processing to form low sheet resistance, shallow junction, boron implanted layers |
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Title: |
Amorphization implants and low temperature rapid thermal processing to form low sheet resistance, shallow junction, boron implanted layers |
Author: |
Wilson, S.R. Paulson, W.M. Gregory, R.B. Lamartine, B.C. Leavitt, J.A. McIntyre Jr., L.C. Seerveld, J.L. |
Appeared in: |
Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms |
Paging: |
Volume 21 (1987) nr. 1-4 pages 5 p. |
Year: |
1987 |
Contents: |
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Publisher: |
Published by Elsevier B.V. |
Source file: |
Elektronische Wetenschappelijke Tijdschriften |
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