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                                       Details for article 68 of 75 found articles
 
 
  The damage recovery and electrical activation of shallow boron implants in silicon: The effects of high energy implants
 
 
Title: The damage recovery and electrical activation of shallow boron implants in silicon: The effects of high energy implants
Author: Kyllesbech Larsen, K.
Privitera, V.
Coffa, S.
Priolo, F.
Spinella, C.
Saggio, M.
Campisano, S.U.
Appeared in: Nuclear instruments and methods in physics research. Section B, Beam interactions with materials and atoms
Paging: Volume 112 (1996) nr. 1-4 pages 5 p.
Year: 1996
Contents:
Publisher: Published by Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 68 of 75 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands