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Journal description
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Details for article 22 of 43 found articles
| Title: |
Interfacial microstructure and electrical properties of HfAlO x thin films on compressively strained Si83Ge17 grown by RF magnetron sputtering |
| Author: |
Qiu, X.Y. Chan, K.C. Lee, P.F. Dong, X.W. Dai, J.Y. |
| Appeared in: |
Microelectronic engineering |
| Paging: | Volume 86 (2009) nr. 11 pages 4 p. |
| Year: |
2009 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 22 of 43 found articles
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