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Journal description
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Details for article 13 of 47 found articles
| Title: |
Dependence of Cu electromigration resistance on selectively deposited CVD Co cap thickness |
| Author: |
Yang, C.-C. Baumann, F. Wang, P.-C. Lee, S.Y. Ma, P. AuBuchon, J. Edelstein, D. |
| Appeared in: |
Microelectronic engineering |
| Paging: | Volume 106 (2013) nr. C pages 5 p. |
| Year: |
2013 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 13 of 47 found articles
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