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Effect of gas introduction position on substrate etching by means of Ar-dominated graphite-cathodic-arc plasma beam in μT-FAD |
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Titel: |
Effect of gas introduction position on substrate etching by means of Ar-dominated graphite-cathodic-arc plasma beam in μT-FAD |
Auteur: |
Tanoue, Hideto Kamiya, Masao Oke, Shinichiro Suda, Yoshiyuki Takikawa, Hirofumi Hasegawa, Yushi Taki, Makoto Tsuji, Nobuhiro Ishikawa, Takeshi Yasui, Haruyuki Temmei, Shuji Takahashi, Hideo |
Verschenen in: |
Thin solid films |
Paginering: |
Jaargang 518 (2010) nr. 13 pagina's 5 p. |
Jaar: |
2010 |
Inhoud: |
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Uitgever: |
Elsevier B.V. |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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