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Details for article 10 of 32 found articles
| Title: |
Effect of gas introduction position on substrate etching by means of Ar-dominated graphite-cathodic-arc plasma beam in μT-FAD |
| Author: |
Tanoue, Hideto Kamiya, Masao Oke, Shinichiro Suda, Yoshiyuki Takikawa, Hirofumi Hasegawa, Yushi Taki, Makoto Tsuji, Nobuhiro Ishikawa, Takeshi Yasui, Haruyuki Temmei, Shuji Takahashi, Hideo |
| Appeared in: |
Thin solid films |
| Paging: | Volume 518 (2010) nr. 13 pages 5 p. |
| Year: |
2010 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 10 of 32 found articles
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