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Carrier separation analysis for clarifying carrier conduction and degradation mechanisms in high-k stack gate dielectrics |
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Titel: |
Carrier separation analysis for clarifying carrier conduction and degradation mechanisms in high-k stack gate dielectrics |
Auteur: |
Mizubayashi, Wataru Yasuda, Naoki Okada, Kenji Ota, Hiroyuki Hisamatsu, Hirokazu Iwamoto, Kunihiko Tominaga, Koji Yamamoto, Katsuhiko Horikawa, Tsuyoshi Nabatame, Toshihide Satake, Hideki Toriumi, Akira |
Verschenen in: |
Microelectronics reliability |
Paginering: |
Jaargang 45 (2005) nr. 7-8 pagina's 10 p. |
Jaar: |
2005 |
Inhoud: |
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Uitgever: |
Elsevier Ltd |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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