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Journal description
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Details for article 11 of 54 found articles
| Title: |
Carrier separation analysis for clarifying carrier conduction and degradation mechanisms in high-k stack gate dielectrics |
| Author: |
Mizubayashi, Wataru Yasuda, Naoki Okada, Kenji Ota, Hiroyuki Hisamatsu, Hirokazu Iwamoto, Kunihiko Tominaga, Koji Yamamoto, Katsuhiko Horikawa, Tsuyoshi Nabatame, Toshihide Satake, Hideki Toriumi, Akira |
| Appeared in: |
Microelectronics reliability |
| Paging: | Volume 45 (2005) nr. 7-8 pages 10 p. |
| Year: |
2005 |
| Contents: | |
| Publisher: |
Elsevier Ltd |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 11 of 54 found articles
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