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                                       Details for article 2 of 26 found articles
 
 
  Advantages of different source/drain engineering on scaled UTBOX FDSOI nMOSFETs at high temperature operation
 
 
Title: Advantages of different source/drain engineering on scaled UTBOX FDSOI nMOSFETs at high temperature operation
Author: Nicoletti, Talitha
Santos, Sara Dereste dos
Martino, João Antonio
Aoulaiche, Marc
Veloso, Anabela
Jurczak, Malgorzata
Simoen, Eddy
Claeys, Cor
Appeared in: Solid-state electronics
Paging: Volume 91 (2014) nr. C pages 6 p.
Year: 2014
Contents:
Publisher: Elsevier Ltd
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 2 of 26 found articles
 
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