Parasitic bipolar impact in 32nm undoped channel Ultra-Thin BOX (UTBOX) and biased Ground Plane FDSOI high-k/metal gate technology
Title:
Parasitic bipolar impact in 32nm undoped channel Ultra-Thin BOX (UTBOX) and biased Ground Plane FDSOI high-k/metal gate technology
Author:
Fenouillet-Beranger, C. Perreau, P. Boulenc, P. Tosti, L. Barnola, S. Andrieu, F. Weber, O. Beneyton, R. Perrot, C. de Buttet, C. Abbate, F. Campidelli, Y. Pinzelli, L. Gouraud, P. Margain, A. Peru, S. Bourdelle, K.K. Nguyen, B.Y. Boedt, F. Poiroux, T. Faynot, O. Skotnicki, T. Boeuf, F.