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  An effective model for analysing tunneling gate leakage currents through ultrathin oxides and high-k gate stacks from Si inversion layers
 
 
Title: An effective model for analysing tunneling gate leakage currents through ultrathin oxides and high-k gate stacks from Si inversion layers
Author: Govoreanu, Bogdan
Blomme, Pieter
Henson, Kirklen
Van Houdt, Jan
De Meyer, Kristin
Appeared in: Solid-state electronics
Paging: Volume 48 (2004) nr. 4 pages 9 p.
Year: 2004
Contents:
Publisher: Elsevier Ltd
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

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