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Journal description
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Details for article 15 of 29 found articles
| Title: |
Electrical properties of 6.3 nm RF oxygen plasma oxide grown near room temperature with in situ dry cleaning of Si surface |
| Author: |
Chanana, R.K Upadhyay, H.N Dwivedi, R Srivastava, S.K |
| Appeared in: |
Solid-state electronics |
| Paging: | Volume 38 (1995) nr. 5 pages 6 p. |
| Year: |
1995 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 15 of 29 found articles
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