High-resistivity with PN interface passivation in 22 nm FD-SOI technology for low-loss passives at RF and millimeter-wave frequencies
Titel:
High-resistivity with PN interface passivation in 22 nm FD-SOI technology for low-loss passives at RF and millimeter-wave frequencies
Auteur:
Nyssens, L. Rack, M. Nabet, M. Schwan, C. Zhao, Z. Lehmann, S. Herrmann, T. Henke, D. Kondrat, A. Soonekindt, C. Koch, F. Kache, T. Kini, D.P. Zimmerhackl, O. Allibert, F. Aulnette, C. Lederer, D. Raskin, J.-P.