nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
Adherent diamond-like carbon coatings on metals via plasma source ion implantation
|
Walter, K.C. |
|
1997 |
93 |
2-3 |
p. 287-291 5 p. |
artikel |
2 |
Application of the ECR slot antenna plasma source for ion implantation
|
Korzec, D. |
|
1997 |
93 |
2-3 |
p. 217-224 8 p. |
artikel |
3 |
A pulsed inductively coupled plasma source for plasma-based ion implantation
|
Tuszewski, M. |
|
1997 |
93 |
2-3 |
p. 203-208 6 p. |
artikel |
4 |
Boron doping of silicon by plasma source ion implantation
|
Matyi, R.J. |
|
1997 |
93 |
2-3 |
p. 247-253 7 p. |
artikel |
5 |
Broad metal ion and plasma beams techniques TAMEK for material surface modification
|
Tolopa, Alexander |
|
1997 |
93 |
2-3 |
p. 168-174 7 p. |
artikel |
6 |
Characterisation of high voltage pulser performance in radiofrequency plasmas
|
Collins, G.A. |
|
1997 |
93 |
2-3 |
p. 181-187 7 p. |
artikel |
7 |
Characteristic features of an apparatus for plasma immersion ion implantation and physical vapour deposition
|
Ensinger, W. |
|
1997 |
93 |
2-3 |
p. 175-180 6 p. |
artikel |
8 |
Characterization of Ti-6A1-4V modified by nitrogen plasma immersion ion implantation
|
Alonso, F. |
|
1997 |
93 |
2-3 |
p. 305-308 4 p. |
artikel |
9 |
Combination of ion implantation and film deposition for forming an antifriction wear-resistant carbon coating
|
Uglov, V.V. |
|
1997 |
93 |
2-3 |
p. 331-334 4 p. |
artikel |
10 |
Commercial plasma source ion implantation facility
|
Scheuer, J.T. |
|
1997 |
93 |
2-3 |
p. 192-196 5 p. |
artikel |
11 |
Depth profilometry of sputtered Ni ions implanted in Ti using pulsed argon and nitrogen plasmas
|
Sarkissian, A.H. |
|
1997 |
93 |
2-3 |
p. 314-317 4 p. |
artikel |
12 |
Diamond-like carbon coating for aluminum 390 alloy — automotive applications
|
Malaczynski, Gerard W. |
|
1997 |
93 |
2-3 |
p. 280-286 7 p. |
artikel |
13 |
Electrical characterization of silicon nitride produced by plasma immersion ion implantation
|
Chen, S.-M. |
|
1997 |
93 |
2-3 |
p. 269-273 5 p. |
artikel |
14 |
Electron-beam and ion-beam treatment of protective coatings produced by ion plating
|
Yagodkin, Yu.D. |
|
1997 |
93 |
2-3 |
p. 327-330 4 p. |
artikel |
15 |
Incident ion monitoring during plasma immersion ion implantation by direct measurements of high-energy secondary electrons
|
Nakamura, K. |
|
1997 |
93 |
2-3 |
p. 242-246 5 p. |
artikel |
16 |
Industrial applications of plasma immersion ion implantation
|
Blawert, C. |
|
1997 |
93 |
2-3 |
p. 274-279 6 p. |
artikel |
17 |
Influence of deposition regimes on structure of ion-plated coatings
|
Kablov, E.N. |
|
1997 |
93 |
2-3 |
p. 335-338 4 p. |
artikel |
18 |
Intense plasma pulses: two modes of the use for surface processing purposes
|
Piekoszewski, J. |
|
1997 |
93 |
2-3 |
p. 209-212 4 p. |
artikel |
19 |
Ion energy distribution in plasma immersion ion implantation
|
Mändl, S. |
|
1997 |
93 |
2-3 |
p. 234-237 4 p. |
artikel |
20 |
Ion implantation based on the uniform distributed plasma
|
Le Coeur, Frédéric |
|
1997 |
93 |
2-3 |
p. 265-268 4 p. |
artikel |
21 |
Irradiation of silicon with a pulsed plasma beam containing Mo ions
|
Piekoszewski, J. |
|
1997 |
93 |
2-3 |
p. 258-260 3 p. |
artikel |
22 |
Measured and calculated dose distribution for 2D plasma immersion ion implantation
|
Mändl, S. |
|
1997 |
93 |
2-3 |
p. 229-233 5 p. |
artikel |
23 |
Metal plasma immersion ion implantation and deposition: a review
|
Anders, André |
|
1997 |
93 |
2-3 |
p. 158-167 10 p. |
artikel |
24 |
Modification of the outgassing rate of stainless steel surfaces by plasma immersion ion implantation
|
Garke, B. |
|
1997 |
93 |
2-3 |
p. 318-326 9 p. |
artikel |
25 |
Noble metal cathodic arc implantation for corrosion control of Ti-6A1-4V
|
Meassick, Steve |
|
1997 |
93 |
2-3 |
p. 292-296 5 p. |
artikel |
26 |
PIII-assisted thin film deposition
|
Schoser, S. |
|
1997 |
93 |
2-3 |
p. 339-342 4 p. |
artikel |
27 |
Plasma immersion ion implantation using pulsed plasma with d.c. and pulsed high voltages
|
Brutscher, Jörg |
|
1997 |
93 |
2-3 |
p. 197-202 6 p. |
artikel |
28 |
Polymer surface modification by plasma source ion implantation
|
Han, Seunghee |
|
1997 |
93 |
2-3 |
p. 261-264 4 p. |
artikel |
29 |
Preface
|
Möller, Wolfhard |
|
1997 |
93 |
2-3 |
p. 157- 1 p. |
artikel |
30 |
Radio-frequency plasma nitriding and nitrogen plasma immersion ion implantation of Ti-6A1-4V alloy
|
Wang, S.Y. |
|
1997 |
93 |
2-3 |
p. 309-313 5 p. |
artikel |
31 |
Shallow junction formation by plasma immersion ion implantation
|
Shao, Jiqun |
|
1997 |
93 |
2-3 |
p. 254-257 4 p. |
artikel |
32 |
Sheath assisted nitrogen ion implantation and diffusion hardening for surface treatment of metals
|
Mukherjee, S. |
|
1997 |
93 |
2-3 |
p. 188-191 4 p. |
artikel |
33 |
Short pulse plasma immersion ion implantation of oxygen into silicon: determination of the energy distribution
|
Barradas, N.P. |
|
1997 |
93 |
2-3 |
p. 238-241 4 p. |
artikel |
34 |
Simulation of plasma-based ion implantation of a sawtooth target
|
Sheridan, T.E. |
|
1997 |
93 |
2-3 |
p. 225-228 4 p. |
artikel |
35 |
Sputter and diffusion processes in a plasma immersion device
|
Bender, H. |
|
1997 |
93 |
2-3 |
p. 213-216 4 p. |
artikel |
36 |
Treatment of various surface treated layers by plasma immersion ion implantation
|
Blawert, C. |
|
1997 |
93 |
2-3 |
p. 297-304 8 p. |
artikel |