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                                       Details for article 19 of 41 found articles
 
 
  Impact of plasma reactive ion etching on low dielectric constant porous organosilicate films' microstructure and chemical composition
 
 
Title: Impact of plasma reactive ion etching on low dielectric constant porous organosilicate films' microstructure and chemical composition
Author: Lépinay, Matthieu
Lee, Daniel
Scarazzini, Riccardo
Bardet, Michel
Veillerot, Marc
Broussous, Lucile
Licitra, Christophe
Jousseaume, Vincent
Bertin, François
Rouessac, Vincent
Ayral, André
Appeared in: Microporous and mesoporous materials
Paging: Volume 228 (2016) nr. C pages 8 p.
Year: 2016
Contents:
Publisher: Elsevier Inc.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 19 of 41 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands