Impact of plasma reactive ion etching on low dielectric constant porous organosilicate films' microstructure and chemical composition
Titel:
Impact of plasma reactive ion etching on low dielectric constant porous organosilicate films' microstructure and chemical composition
Auteur:
Lépinay, Matthieu Lee, Daniel Scarazzini, Riccardo Bardet, Michel Veillerot, Marc Broussous, Lucile Licitra, Christophe Jousseaume, Vincent Bertin, François Rouessac, Vincent Ayral, André