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Journal description
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Details for article 16 of 35 found articles
| Title: |
Erratum to “Atomic-scale theory on degradation of HfSiON gate stacks by atomic hydrogen accompanied by its interaction with oxygen vacancy and substitutional nitrogen” [Microelectron. Eng. 88 (7) (2011) 1457–1460] |
| Author: |
Nakasaki, Yasushi Hirano, Izumi Kato, Koichi Mitani, Yuuichiro |
| Appeared in: |
Microelectronic engineering |
| Paging: | Volume 88 (2011) nr. 11 pages 1 p. |
| Year: |
2011 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 16 of 35 found articles
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