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Journal description
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Details for article 5 of 30 found articles
| Title: |
CHF3–O2 reactive ion etching of 4H-SiC and the role of oxygen |
| Author: |
Xia, J.H. Rusli, Choy, S.F. Gopalakrishan, R. Tin, C.C. Yoon, S.F. Ahn, J. |
| Appeared in: |
Microelectronic engineering |
| Paging: | Volume 83 (2006) nr. 2 pages 6 p. |
| Year: |
2006 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 5 of 30 found articles
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