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                             8 results found
no title author magazine year volume issue page(s) type
1 AlN Etching under ICP Cl2/BCl3/Ar Plasma Mixture: Experimental Characterization and Plasma Kinetic Model Rammal, Mohammad

4 27 p. 1579-1587
article
2 Characterization of AlN-based Ceramic Composites for Use as Millimeter Wave Susceptor Materials at High Temperature: High Temperature Thermal Properties of AlN:Mo with 0.25% to 4.0% Mo by Volume Hoff, Brad W.

4 27 p. 1531-1542
article
3 Effects of nitrogen impurity on zno crystal growth on Si substrates Muraoka, Soichiro

4 27 p. 1557-1563
article
4 Impact of CMOS TiN metal gate process on microstructure and its correlation with electrical properties Kumar, Pushpendra

4 27 p. 1565-1571
article
5 Material Characterization of Plasma-Treated Aluminum Particles via Different Gases Wu, Chi-Chin

4 27 p. 1589-1595
article
6 Polymer Patterning via Electrohydrodynamic Instabilities Copenhaver, Katie

4 27 p. 1543-1550
article
7 Sputter Epitaxy of (ZnO)x(InN)1-x films on Lattice-mismatched Sapphire Substrate Miyahara, Nanoka

4 27 p. 1551-1556
article
8 VHF Plasma CVD Synthesis of Photochromic ZnO Nanoparticle Kajiyama, Hiroshi

4 27 p. 1573-1577
article
                             8 results found
 
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