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                             226 gevonden resultaten
nr titel auteur tijdschrift jaar jaarg. afl. pagina('s) type
1 Ab Initio Modeling of the Electronic and Energy Structure and Opening the Band Gap of a 4p-Element-Doped Graphene Monolayer Asadov, M. M.

5 p. 314-323
artikel
2 A Computer Investigation of the Effect of High-Resistance Layer Inhomogeneities on Resistive Switching in a Bismuth Selenide Microcrystal Structure Sirotkin, V. V.

5 p. 363-371
artikel
3 Active Integral High Pass Filters Rekhviashvili, S. Sh.

5 p. 311-317
artikel
4 Active Rectifier with Low Losses Babenko, V. P.

5 p. 318-324
artikel
5 Afanas’ev Aleksandr Mikhailovich 06/08/1938-08/10/2010 2011
5 p. 301-302
artikel
6 A generalized theory of charge transport in low-barrier Mott diodes with near-surface δ-doping: Comparison with experimental data Shashkin, V. I.
2010
5 p. 323-330
artikel
7 Aligned carbon tubes synthesized using porous aluminum oxide Vorob’eva, A. I.
2012
5 p. 285-292
artikel
8 An adsorption ellipsometric method for studying porous films and coatings Tolmachev, V. A.

5 p. 331-344
artikel
9 Analytic Model of Transit-Time Diodes and Transistors for the Generation and Detection of THz Radiation Vyurkov, V. V.
2018
5 p. 290-298
artikel
10 A new method of formation of the masking image (relief) directly during the electron-beam exposure of the resist Bruk, M. A.
2013
5 p. 261-269
artikel
11 A New Voltage Level Shifter For Low-Power Applications Shubin, V. V.
2019
5 p. 335-339
artikel
12 Annealing of Radiation and Electrostatic-Discharge Damages in Semiconductor Devices M. I. Gorlov
2002
5 p. 295-304
10 p.
artikel
13 Annealing of Radiation and Electrostatic-Discharge Damages in Semiconductor Devices Gorlov, M. I.
2002
5 p. 295-304
artikel
14 An Overview of the NBTI Phenomenon in MOS Devices DhiaElhak Messaoud,

5 p. 439-468
artikel
15 Applications of the Technology of Fast Neutral Particle Beams in Micro- and Nanoelectronics Kudrya, V. P.
2018
5 p. 332-343
artikel
16 Aspect-ratio-independent anisotropic silicon etching in a plasma chemical cyclic process Morozov, O. V.
2007
5 p. 333-341
artikel
17 A table MOS transistor model parameter control Denisenko, V. V.
2010
5 p. 352-365
artikel
18 A thermodynamic model of the influence of atomic impurities on the adhesion strength of interfaces Alekseev, I. M.
2011
5 p. 303-308
artikel
19 Automation of Pulse Electric Strength Test of Electronic Component Base Dyatlov, N. S.
2019
5 p. 340-345
artikel
20 Borophosphosilicate Glass Films in Silicon Microelectronics, Part 1: Chemical Vapor Deposition, Composition, and Properties V. Y. Vasilev
2004
5 p. 271-284
14 p.
artikel
21 Borophosphosilicate Glass Films in Silicon Microelectronics, Part 1: Chemical Vapor Deposition, Composition, and Properties Vasilev, V. Y.
2004
5 p. 271-284
artikel
22 Chaotic Solid-State Oscillators of High Spectral Stability with a Wideband Negative-Differential-Resistance Subsystem V. G. Prokopenko
2003
5 p. 301-306
6 p.
artikel
23 Chaotic Solid-State Oscillators of High Spectral Stability with a Wideband Negative-Differential-Resistance Subsystem Prokopenko, V. G.
2003
5 p. 301-306
artikel
24 Characterization of Selectively Doped InAs-Quantum-Dot GaAs-Based Multilayer Heterostructures by High-Resolution X-ray Diffraction E. M. Pashaev
2002
5 p. 310-317
8 p.
artikel
25 Characterization of Selectively Doped InAs-Quantum-Dot GaAs-Based Multilayer Heterostructures by High-Resolution X-ray Diffraction Pashaev, E. M.
2002
5 p. 310-317
artikel
26 Charge transfer and structural—impurity complexes in the transition layer of the Si/SiO2 system Krasnikov, G. Ya.

5 p. 307-310
artikel
27 Charge transport in thin layers of ferroelectric Hf0.5Zr0.5O2 Orlov, O. M.
2016
5 p. 350-356
artikel
28 Charge Transport Mechanism in a Formless Memristor Based on Silicon Nitride Orlov, O. M.

5 p. 372-377
artikel
29 Chip training conditions Gorlov, M. I.

5 p. 349-353
artikel
30 Coatings of contact areas of crystals and the traverse of packages for microwelding of internal outputs of 3D wares Zenin, V. V.
2013
5 p. 288-300
artikel
31 Combined two-band models of resonant tunneling diodes Abramov, I. I.
2012
5 p. 314-323
artikel
32 Commemorating Vladimir G. Mokerov: The 70th anniversary of his birth 2010
5 p. 299-302
artikel
33 Comparative Study of an RF and a Microwave High-Density-Plasma Source for Plasma Immersion Ion Implantation S. N. Averkin
2003
5 p. 292-300
9 p.
artikel
34 Comparative Study of an RF and a Microwave High-Density-Plasma Source for Plasma Immersion Ion Implantation Averkin, S. N.
2003
5 p. 292-300
artikel
35 Computer Investigation of the Influence of Metal Contact Inhomogenees on Resistive Switching in a Heterostructure Based on Bismuth Selenide Sirotkin, V. V.

5 p. 326-332
artikel
36 Controlling Electrical Transport through Bundles of Single-Wall Carbon Nanotubes I. I. Bobrinetskii
2004
5 p. 292-297
6 p.
artikel
37 Controlling Electrical Transport through Bundles of Single-Wall Carbon Nanotubes Bobrinetskii, I. I.
2004
5 p. 292-297
artikel
38 Control of the adhesion strength of thin metal films in multilayer structures Taliashvili, Z. I.
2007
5 p. 313-320
artikel
39 Custom Logic: A Toolkit for the Design of VLSI Custom Control MOS Logic P. N. Bibilo
2004
5 p. 310-327
18 p.
artikel
40 Custom Logic: A Toolkit for the Design of VLSI Custom Control MOS Logic Bibilo, P. N.
2004
5 p. 310-327
artikel
41 Decimation filter of the delta-sigma analog-to-digital converter with ternary data encoding Morozov, D. V.
2011
5 p. 352-360
artikel
42 Deep-Level Effects in GaAs Microelectronics: A Review N. P. Khuchua
2003
5 p. 257-274
18 p.
artikel
43 Deep-Level Effects in GaAs Microelectronics: A Review Khuchua, N. P.
2003
5 p. 257-274
artikel
44 Deposition of Nanoscale Films with Fractal Topography I. N. Serov
2004
5 p. 263-270
8 p.
artikel
45 Deposition of Nanoscale Films with Fractal Topography Serov, I. N.
2004
5 p. 263-270
artikel
46 Design of a Thin-Film Thermoelectric Generator for Low-Power Applications Korotkov, A. S.
2019
5 p. 326-334
artikel
47 Determination of the probability of the heterogeneous recombination of chlorine atoms on the construction materials of plasma chemical reactors Iventichev, M. Yu.
2011
5 p. 316-320
artikel
48 Deterministic and nondeterministic failure models of LSI circuits exposed to radiation Barbashov, V. M.
2015
5 p. 312-315
artikel
49 Diffusion of Nitrogen Atoms Implanted into Synthetic Diamonds E. I. Cherepov
2002
5 p. 277-281
5 p.
artikel
50 Diffusion of Nitrogen Atoms Implanted into Synthetic Diamonds Cherepov, E. I.
2002
5 p. 277-281
artikel
51 Discrete electron states at the Si(100)/SiO2 interface Kirillova, S. I.

5 p. 345-348
artikel
52 Dynamic model of a memory cell based on tunnel magnetoresistance Kostrov, A. I.
2011
5 p. 361-368
artikel
53 Effect of additions of Ar and He on the parameters and composition of the HBr plasma Smirnov, A. A.
2010
5 p. 366-375
artikel
54 Effect of barrier-layer deposition conditions on reliability of on-chip wiring Emel’yanov, A. V.
2011
5 p. 321-325
artikel
55 Effect of diamond dicing of SiC device wafers on the technical and operational parameters of monolithic integrated circuits Gamkrelidze, S. A.
2017
5 p. 323-328
artikel
56 Effect of Discontinuities on ULSI On-Chip Interconnection Characteristics V. A. Goryachev
2002
5 p. 326-334
9 p.
artikel
57 Effect of Discontinuities on ULSI On-Chip Interconnection Characteristics Goryachev, V. A.
2002
5 p. 326-334
artikel
58 Effect of the Material of Electrodes on Electroformation and Properties of Memristors Based on Open Metal–SiO2–Metal Sandwich Structures Mordvintsev, V. M.

5 p. 419-428
artikel
59 Effect of the reflection coefficients on the conductivity of a thin metal layer in the case of an inhomogeneous time-periodic electric field Utkin, A. I.
2016
5 p. 357-366
artikel
60 Efficient control over heat transfer and hydrodynamics in closed regions due to optimal selection of materials for enclosure walls and external heat load Kuznetsov, G. V.
2011
5 p. 326-332
artikel
61 Electrical parameters and concentrations of charged particles in methane plasma Semenova, O. A.
2013
5 p. 301-308
artikel
62 Electrode geometry as dependent on electrolyte temperature in thick Cu film electrodeposition for making tunnel multilayer structures Jangidze, L. B.
2008
5 p. 322-326
artikel
63 Electroforming of Si/SiO2/W Structures with an Exposed Nanometer-Thick SiO2Layer V. M. Mordvintsev
2001
5 p. 303-311
9 p.
artikel
64 Electroforming of Si/SiO2 /W Structures with an Exposed Nanometer-Thick SiO2Layer Mordvintsev, V. M.
2001
5 p. 303-311
artikel
65 Electrolyte hydrodynamics in anodic alumina pores Sokol, V. A.
2014
5 p. 358-360
artikel
66 Electron-Beam Two-Stream Instability in Quantum-Effect Structures A. E. Dubinov
2001
5 p. 339-341
3 p.
artikel
67 Electron-Beam Two-Stream Instability in Quantum-Effect Structures Dubinov, A. E.
2001
5 p. 339-341
artikel
68 Electron distribution density in a low voltage SEM probe Novikov, Yu. A.
2014
5 p. 361-370
artikel
69 Electron-optical properties of charged conical dielectric rings Zhukov, V. A.
2012
5 p. 299-309
artikel
70 Electrophysical parameters and concentrations of active particles in the plasma of HCl mixtures with inert and molecular gases Dunaev, A. V.
2014
5 p. 352-357
artikel
71 Electrophysical Parameters and Emission Spectra of the Glow Discharge of Difluorodichloromethane Murin, D. B.

5 p. 337-343
artikel
72 Energy and Noise Characteristics of a SEPIC/CuK Converter with Bipolar Output Babenko, V. P.

5 p. 357-363
artikel
73 Engineering Approach to CMOS-Logic Optimization Allowing for Internal Capacitances and On-Chip Interconnections Butuzov, A. V.
2005
5 p. 328-338
artikel
74 Erratum to: Application of the Tikhonov Regularization Method in Problems of Ellipsometic Porometry of Low-K Dielectrics Gaidukasov, R. A.

5 p. 358
artikel
75 Error-correction coding in CMOS RAM resistant to the effect of single nuclear particles Petrov, K. A.
2015
5 p. 316-323
artikel
76 ESR Study of P-doped, Zn-compensated Si Single Crystals Dobryakov, S. N.
2005
5 p. 325-327
artikel
77 Experimental diamond photonics: Current state and prospects. Part I Tsukanov, A. V.
2016
5 p. 299-313
artikel
78 Fabrication of 0.5-μm structures by dry electron lithography and anisotropic plasma etching Amirov, I. I.

5 p. 311-315
artikel
79 Features of the Architecture Implementing the Dataflow Computational Model and Its Application in the Creation of Microelectronic High-Performance Computing Systems Zmeev, D. N.
2019
5 p. 292-298
artikel
80 Features of the Operation of a Three-Electrode Electrostatic Microgenerator in the Presence of Collisions between Electrodes Dragunov, V. P.

5 p. 334-348
artikel
81 Formal Description of Digital Control System Operation and Its Use in Designing Stempkovsky, A. L.
2019
5 p. 318-325
artikel
82 Formation of local insulating regions in Si/Si—Ge structures by ion implantation with subsequent stain etching Starkov, V. V.

5 p. 294-298
artikel
83 Frequency characteristics of a broadband submicron SOI-based photonic phase modulator Masal’skii, N. V.
2014
5 p. 371-376
artikel
84 Frequency-response equalization in integrated current amplifiers with collector—base cross coupling Prokopenko, V. G.

5 p. 299-302
artikel
85 Functional Properties and Frequency Characteristics of Low-Sensitive RC Filters Based on Micropower Operational Amplifiers Denisenko, D. Yu.
2019
5 p. 299-309
artikel
86 GaAs/AlAs resonant-tunneling diode for subharmonic mixers Alkeev, N. V.
2010
5 p. 331-339
artikel
87 Generation of fast neutral beams based on closed drift ion sources Maishev, Yu. P.
2014
5 p. 345-351
artikel
88 High-speed, high-resolution analog-to-digital converter with prediction Volkov, I. V.
2011
5 p. 343-351
artikel
89 Implementation of a Two-Qubit C-NOT Quantum Gate in a System of Two Double Quantum Dots, a Microcavity, and a Laser Tsukanov, A. V.
2018
5 p. 279-289
artikel
90 Implementation of Interpolation in Read-out ASIC for GEM Detectors Shumikhin, V. V.

5 p. 353-356
artikel
91 In Celebration of Tatevos M. Agakhanyan's 80th Birthday 2004
5 p. 261-262
2 p.
artikel
92 In Celebration of Tatevos M. Agakhanyan's 80th Birthday 2004
5 p. 261-262
artikel
93 Incoming Control of Solid-State Parts: A Review M. I. Gorlov
2003
5 p. 315-321
7 p.
artikel
94 Incoming Control of Solid-State Parts: A Review Gorlov, M. I.
2003
5 p. 315-321
artikel
95 Influence of Hot Carrier Degradation on the Characteristics of a High-Voltage SOI Transistor with a Large Drift Region Novoselov, A. S.

5 p. 411-418
artikel
96 Influence of metallization impedance on the current distribution along the conducting tracks from a FET operated in saturation Sergeev, V. A.
2008
5 p. 327-333
artikel
97 Influence of Point Defects on the Initiation of Electromigration in an Impurity Conductor Makhviladze, T. M.

5 p. 339-346
artikel
98 Influence of the pressure of the gas medium and duration of controlling pulses on the stability of characteristics of memory cells based on electroformed Si-SiO2-W structures Mordvintsev, V. M.
2010
5 p. 313-322
artikel
99 In situDiagnostics of Plasma Processes in Microelectronics: The Current Status and Immediate Prospect, Part III A. A. Orlikovskii
2001
5 p. 275-294
20 p.
artikel
100 In situDiagnostics of Plasma Processes in Microelectronics: The Current Status and Immediate Prospect, Part III Orlikovskii, A. A.
2001
5 p. 275-294
artikel
101 Instability Conditions of the Stationary Nonconducting State for the Bispin A. P. Lysenko
2002
5 p. 335-339
5 p.
artikel
102 Instability Conditions of the Stationary Nonconducting State for the Bispin Lysenko, A. P.
2002
5 p. 335-339
artikel
103 Installation for etching and deposition of thin-film structures by a fast neutral particle beam Maishev, Yu. P.
2015
5 p. 304-311
artikel
104 Investigation into the statistical nature of Bell’s inequalities Bogdanov, Yu. I.
2008
5 p. 308-321
artikel
105 Investigation of a Capacitor Array of a Composite Capacitive Touch Panel Vlasov, A. I.
2018
5 p. 299-306
artikel
106 Investigation of Characteristics of Electrostatically Actuated MEMS Switch with an Active Contact Breaking Mechanism Uvarov, I. V.
2018
5 p. 307-316
artikel
107 Investigation of the features of integrating nonvolatile FRAM elements with CMOS technology Orlov, O. M.
2017
5 p. 353-358
artikel
108 Investigation of the Process of Plasma Through Etching of HkMG Stack of Nanotransistor with a 32-nm Critical Dimension Myakonkikh, A. V.
2018
5 p. 323-331
artikel
109 Investigation of the Thermophysical Properties of the SiGe Semiconductor Material Shorstov, S. Yu.

5 p. 295-301
artikel
110 Isotropic Plasma Etching of SiO2 Films A. A. Kovalevskii
2002
5 p. 290-294
5 p.
artikel
111 Isotropic Plasma Etching of SiO2 Films Kovalevskii, A. A.
2002
5 p. 290-294
artikel
112 Kinetics of the interaction between a CCl2F2 radio-frequency discharge and gallium arsenide Pivovarenok, S. A.
2016
5 p. 345-349
artikel
113 Local Modification of the Optical Constants of Polymeric Films by Ion Implantation A. V. Leont'ev
2001
5 p. 324-329
6 p.
artikel
114 Local Modification of the Optical Constants of Polymeric Films by Ion Implantation Leont'ev, A. V.
2001
5 p. 324-329
artikel
115 Logical optimization efficiency in the synthesis of combinational circuits Avdeev, N. A.
2015
5 p. 338-354
artikel
116 Low-noise amplifier for the range of 57–64 GHz with grounding holes through photolake layer Krapukhin, D. V.
2017
5 p. 343-352
artikel
117 Low-temperature annealing of SIMOX structures in an inhomogeneous temperature field Rudakov, V. I.

5 p. 324-330
artikel
118 Magnetic Permeability of Co–Ni–Fe Alloy Films Obtained by Electrochemical Deposition Tikhonov, R. D.

5 p. 273-281
artikel
119 Magnetic structure and magnetoresistance of patterned epitaxial iron thin films: The influence of shape and magnetocrystalline anisotropy Fomin, L. A.
2008
5 p. 283-295
artikel
120 Magnetoconcentration effect on a base pn junction of a bipolar magnetotransistor Tikhonov, R. D.
2010
5 p. 340-351
artikel
121 Memristive Properties of Manganite-Based Planar Structures Tulina, N. A.

5 p. 349-357
artikel
122 Method for the Microwave Measurement of Carrier Lifetime in Lightly Doped Silicon Ingots Borodovskii, P. A.
2005
5 p. 316-324
artikel
123 Modeling SiO2 leakage currents caused by electrical overloads Polunin, V. A.
2017
5 p. 359-364
artikel
124 Modeling the Characteristics of SOI CMOS Nanotransistors with an Asymmetric Surrounding Gate Masal’skii, N. V.

5 p. 324-331
artikel
125 Modified CMBS circuit technology domino Lementuev, V. A.
2015
5 p. 335-337
artikel
126 MOS-Controlled Thyristor: A Study of a Promising Power-Switching Device E. V. Chernyavskii
2002
5 p. 318-322
5 p.
artikel
127 MOS-Controlled Thyristor: A Study of a Promising Power-Switching Device Chernyavskii, E. V.
2002
5 p. 318-322
artikel
128 Mossbauer-Spectroscopy Characterization of Nanostructured Magnetic Materials Aksenova, N. P.
2005
5 p. 279-294
artikel
129 Nanosecond-Pulse Annealing of Heavily Doped Ge:Sb Layers on Ge Substrates Batalov, R. I.
2018
5 p. 354-363
artikel
130 Neuromorphic Systems: Devices, Architecture, and Algorithms Fetisenkova, K. A.

5 p. 393-410
artikel
131 Nonalloyed ohmic contacts for high-electron-mobility transistors based on AlGaN/GaN heterostructures Pavlov, A. Yu.
2017
5 p. 316-322
artikel
132 Nondestructive contactless electron-beam diagnostics of microelectronic device structures Aleksandrov, A. F.
2010
5 p. 303-312
artikel
133 Novel Ion-Lens Configurations: A Further Step to 2-nm Ion-Beam Lithography V. A. Zhukov
2003
5 p. 282-287
6 p.
artikel
134 Novel Ion-Lens Configurations: A Further Step to 2-nm Ion-Beam Lithography Zhukov, V. A.
2003
5 p. 282-287
artikel
135 Numerical Solution of the ThomasFermi Equation for the Centrally Symmetric Atom N. A. Zaitsev
2004
5 p. 303-309
7 p.
artikel
136 Numerical Solution of the Thomas–Fermi Equation for the Centrally Symmetric Atom Zaitsev, N. A.
2004
5 p. 303-309
artikel
137 On the Construction of Neuromorphic Fault Dictionaries for Analog Integrated Circuits Mosin, S. G.
2019
5 p. 310-317
artikel
138 On the Mechanisms Regulating the Plasma Composition and Kinetics of Heterogeneous Processes in a CF4 + CHF3 + Ar Mixture Efremov, A. M.

5 p. 302-310
artikel
139 Optical monitoring of substrate temperature and etching speed of multilayered structures during plasmochemical etching Volkov, P. V.
2011
5 p. 309-315
artikel
140 Optimization of the properties of diamond structures with nitrogen-vacancy centers Tsukanov, A. V.
2015
5 p. 283-296
artikel
141 Optomechanical systems and quantum computing Tsukanov, A. V.
2011
5 p. 333-342
artikel
142 Organizing the memory array of multiport register files to reduce power consumption Solovyeva, L. A.
2017
5 p. 334-342
artikel
143 Parameters of plasma and mechanisms of etching of metals and semiconductors in HCl + Ar, H2, O2, and Cl2 mixtures Efremov, A. M.
2015
5 p. 297-303
artikel
144 Patterns of the Formation of Mobile Localized Magnetic Configurations and Technology for Manufacturing Structures for the Implementation of Magnetic Memory Elements Prokaznikov, A. V.

5 p. 379-392
artikel
145 Peculiarities of the energy landscape of a rectangular magnetic nanoisland Trushin, O. S.
2017
5 p. 309-315
artikel
146 Performance improvement of CCD image sensor arrays Arutyunov, V. A.

5 p. 303-306
artikel
147 Phase Formation during the Surface-Diffusion Growth of TiCoSiN and TiCoN Thin Films on Si and SiO2 A. G. Vasiliev
2001
5 p. 295-302
8 p.
artikel
148 Phase Formation during the Surface-Diffusion Growth of Ti–Co–Si–N and Ti–Co–N Thin Films on Si and SiO2 Vasiliev, A. G.
2001
5 p. 295-302
artikel
149 Phase Formation in a TaNiN Thin Film during Its Electron-Beam Evaporation Deposition on a Heated Si(100) Substrate A. G. Vasiliev
2003
5 p. 275-281
7 p.
artikel
150 Phase Formation in a Ta–Ni–N Thin Film during Its Electron-Beam Evaporation Deposition on a Heated Si(100) Substrate Vasiliev, A. G.
2003
5 p. 275-281
artikel
151 Physical and Topological Modeling of a Volume Condenser Structure with a Schottky Barrier Rekhviashvili, S. Sh.

5 p. 347-352
artikel
152 Physicochemical deposition features of peritectic alloys for high-density chipping of silicon crystals Roshchin, V. M.
2016
5 p. 324-328
artikel
153 Polycrystalline-Silicon LPCVD by Propene-Assisted Silane Pyrolysis: A Study of the Process and the Films V. G. Erkov
2002
5 p. 282-289
8 p.
artikel
154 Polycrystalline-Silicon LPCVD by Propene-Assisted Silane Pyrolysis: A Study of the Process and the Films Erkov, V. G.
2002
5 p. 282-289
artikel
155 Possibilities of thick films of microelectronics in the development of the circuitry of radio engineering systems (Review) Podvigalkin, V. Ya.
2013
5 p. 276-287
artikel
156 Protective Free-Standing Films for Projection Lithography Installations in the Extreme UV Range Zuev, S. Yu.

5 p. 344-355
artikel
157 Quantum calculations on quantum dots in semiconductor microcavities. Part I Tsukanov, A. V.
2014
5 p. 315-327
artikel
158 Reactive Ion-Beam Etching of Thick Polyimide Layers in an Oxygen Argon Mixture A. I. Stognij
2001
5 p. 330-334
5 p.
artikel
159 Reactive Ion-Beam Etching of Thick Polyimide Layers in an Oxygen + Argon Mixture Stognij, A. I.
2001
5 p. 330-334
artikel
160 Reliability Investigation of 0.18-μm SOI MOS Transistors at High Temperatures Benediktov, A. S.
2018
5 p. 317-322
artikel
161 Resistive switching in TiN/HfxAl1 − xOy/HfO2/TiN and TiN/HfO2/Ti/TiN structures Orlov, O. M.
2014
5 p. 328-332
artikel
162 Role of deep-level centers in compensated semi-insulating GaAs Katsoev, V. V.
2008
5 p. 296-301
artikel
163 Sample-and-hold circuits for high-speed A/D converters Gumenyuk, A. S.
2007
5 p. 342-352
artikel
164 Schmidt decomposition and analysis of statistical correlations Bogdanov, Yu. I.
2016
5 p. 314-323
artikel
165 Schmidt Decomposition and Coherence of Interfering Alternatives Fastovets, D. V.

5 p. 287-296
artikel
166 Semiconductor nanotube plasma Eminov, P. A.
2014
5 p. 333-344
artikel
167 Sign of bipolar-magnetotransistor sensitivity as dependent on device structure Tikhonov, R. D.
2008
5 p. 334-345
artikel
168 Silicide iridium sensors based on solid sensitive elements Kerimov, E. A.
2017
5 p. 329-333
artikel
169 Silicon nanowire field effect transistor made of silicon-on-insulator Presnov, D. E.
2012
5 p. 310-313
artikel
170 Silicon-Surface Restructuring under Cleaning as a Method for Improving Al/Mo-to-Si Contact Resistance and Microwave-BJT Parameters Yu. P. Snitovsky
2004
5 p. 298-302
5 p.
artikel
171 Silicon-Surface Restructuring under Cleaning as a Method for Improving Al/Mo-to-Si Contact Resistance and Microwave-BJT Parameters Snitovsky, Yu. P.
2004
5 p. 298-302
artikel
172 Simulating the chlorine plasma etching profile of high-aspect-ratio trenches in Si Shumilov, A. S.
2017
5 p. 301-308
artikel
173 Simulation of Resistive Switching in Memristor Structures Based on Transition Metal Oxides Permyakova, O. O.

5 p. 303-313
artikel
174 Simulation of the characteristics of the DICE 28-nm CMOS cells in unsteady states caused by the effect of single nuclear particles Stenin, V. Ya.
2015
5 p. 324-334
artikel
175 Simulation of the Effect of Lattice Defects on the Work of Joined Materials Separation Makhviladze, T. M.

5 p. 356-362
artikel
176 Simulation of Transients in a Majority Gate upon Switching and Collecting Charge from the Track of a Single Particle Stenin, V. Ya.

5 p. 332-344
artikel
177 Single-Electron Transistor Based on a Linear Structure of Three Electrically and Optically Controlled Tunnel-Coupled Quantum Dots Tsukanov, A. V.
2019
5 p. 283-291
artikel
178 Si3N4 SOI Structures Produced by Nitrogen Ion Implantation at High Energies and Beam Current Densities F. F. Komarov
2002
5 p. 305-309
5 p.
artikel
179 Si3N4 SOI Structures Produced by Nitrogen Ion Implantation at High Energies and Beam Current Densities Komarov, F. F.
2002
5 p. 305-309
artikel
180 Si/SiO2Structures with Quantum Size Effects: The Construction of a Low-Dimensional Nanoscale Electronic System in the Interface Layer of Si by Incorporating a Regularly Distributed Charge into SiO2 E. I. Gol'dman
2001
5 p. 312-316
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181 Si/SiO2Structures with Quantum Size Effects: The Construction of a Low-Dimensional Nanoscale Electronic System in the Interface Layer of Si by Incorporating a Regularly Distributed Charge into SiO2 Gol'dman, E. I.
2001
5 p. 312-316
artikel
182 Small-signal optimization approach to design of microwave signal switch ICs on MOS transistors Elesin, V. V.
2017
5 p. 365-369
artikel
183 Specific features of intensification of silicon etching in CF4/O2 plasma Grigoryev, Yu. N.
2007
5 p. 321-332
artikel
184 Specific Features of the Kinetics of the Reactive-Ion Etching of Si and SiO2 in a CF4 + O2 Mixture in a Low Power Supply Mode Efremov, A. M.

5 p. 303-310
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185 Stationary High-Field Domain in Si : Zn at the Excitation Threshold of Recombination Waves A. V. Gostev
2003
5 p. 288-291
4 p.
artikel
186 Stationary High-Field Domain in Si : Zn at the Excitation Threshold of Recombination Waves Gostev, A. V.
2003
5 p. 288-291
artikel
187 Strain transmission from a substrate to a piezoresistive mesa Lubimsky, V. M.
2007
5 p. 305-312
artikel
188 Structural and Luminescent Properties of SiOxNy(Si) Nanocomposite Films Baru, V. G.
2005
5 p. 272-278
artikel
189 Study and Analysis of NBTI Effect on pMOSFET Using Fast Measurement Technique Abdelmadjid Benabdelmoumene,

5 p. 429-438
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190 Study of plasma radiation spectra of (HCl + Ar, H2, and Cl2) mixtures in GaAs etching Dunaev, A. V.
2016
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artikel
191 Study of the Effect of Self-Heating in High-Voltage SOI Transistors with a Large Drift Region Rumyantsev, S. V.

5 p. 325-333
artikel
192 Study of the Effect of Technetium as a Component of the Catalysts of the REE Compounds on the Process of Decomposition of Monohydrides of Silicon and Germanium Kovalevskiy, A. A.
2019
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artikel
193 Study of the Magneto-Optical Properties of Structures on Curved Surfaces for Creating Memory Elements on Magnetic Vortices Prokaznikov, A. V.

5 p. 358-371
artikel
194 Study of the Plasma Resistance of a High Resolution e-Beam Resist HSQ for Prototyping Nanoelectronic Devices Miakonkikh, A. V.

5 p. 297-302
artikel
195 Study of the Relaxational Polarization Dynamics of the LiPON Solid Electrolyte Rudyi, A. S.

5 p. 345-357
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196 Study of the Thermal Stability of Copper Contact Junctions in Si/SiO2 Substrates Vorobieva, A. I.

5 p. 282-294
artikel
197 Sustaining Mechanisms of the ECR Heating of Electrons in Low-Pressure Microwave Plasmas under Magnetic Multipole Confinement Petrin, A. B.
2005
5 p. 295-308
artikel
198 Switching the direction of circumferential magnetization of square epitaxial Fe (001) microstructures by spin-polarized current Fomin, L. A.
2013
5 p. 309-313
artikel
199 Synthesis and use of anodic borosilicate diffusion sources Baranov, I. L.
2008
5 p. 302-307
artikel
200 The algorithmic model of a pipelined analog-to-digital converter Rogatkin, Yu. B.
2007
5 p. 299-304
artikel
201 The Effect of Contact Window Cleaning and Doping in BF3 H2and BF3 H2 CF4Plasmas on the Mop-Si Contact Resistance Yu. P. Snitovskii
2001
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4 p.
artikel
202 The Effect of Contact Window Cleaning and Doping in BF3+ H2and BF3+ H2+ CF4Plasmas on the Mo–p+-Si Contact Resistance Snitovskii, Yu. P.
2001
5 p. 335-338
artikel
203 The energy of activation of electromigration in aluminum conductors tested by the drift-velocity method Kononenko, O. V.

5 p. 316-323
artikel
204 The hyperfine energy spectrum of31P donors in a silicon NMR quantum computer Valiev, K. A.

5 p. 285-293
artikel
205 The influence of microwave plasma microtreatment at low adsorption on the nanomorphology of the surface of silicon (100) crystals Shanygin, V. Ya.
2013
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artikel
206 The Influence of Small F2, H2, and HF Additives on the Concentration of Active Particles in Tetrafluoromethane Plasma Efremov, A. M.

5 p. 372-378
artikel
207 The Model of the Process of the Chemical Mechanical Polishing of the Copper Metallization, Based on the Formation of the Passivation Layer Makhviladze, T. M.
2018
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artikel
208 The 50th Anniversary of the Ministry of Defense's 22 TsNIII Research Institute: Its Contributions to the National Microelectronics Telets, V. A.
2005
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artikel
209 Thin-film positive electrode based on vanadium oxides for lithium-ion accumulators Vasil’ev, S. V.
2016
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artikel
210 Thin-Film Solid State Lithium-Ion Batteries of the LiCoC2/LiPON/Si@O@Al System Rudy, A. S.

5 p. 333-338
artikel
211 Tip-Shape Reconstruction for a Laterally Vibrating SPM Probe Chuklanov, A. P.
2005
5 p. 309-315
artikel
212 To the Issue of the Memristor’s HRS and LRS States Degradation and Data Retention Time Fadeev, A. V.

5 p. 311-325
artikel
213 Transformation of the habit of natural diamond crystals during activation of nonequilibrium processes Karasev, V. Yu.
2012
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artikel
214 Transformations of porous layers upon high-temperature annealing: Simulation Govorukha, T. B.
2007
5 p. 288-298
artikel
215 Transient Analysis of Shielded On-Chip Interconnections V. A. Goryachev
2003
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artikel
216 Transient Analysis of Shielded On-Chip Interconnections Goryachev, V. A.
2003
5 p. 307-314
artikel
217 Trench-Gate MOS-Controlled Thyristor: An Evaluation E. V. Chernyavskii
2002
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3 p.
artikel
218 Trench-Gate MOS-Controlled Thyristor: An Evaluation Chernyavskii, E. V.
2002
5 p. 323-325
artikel
219 Tunneling in MOS Systems: The Dependence of the Effective Barrier Height on the Structure of the Transition Layer at the Si/SiO2Interface in the Presence of Impurities G. Ya. Krasnikov
2001
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7 p.
artikel
220 Tunneling in MOS Systems: The Dependence of the Effective Barrier Height on the Structure of the Transition Layer at the Si/SiO2Interface in the Presence of Impurities Krasnikov, G. Ya.
2001
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artikel
221 Uniformity of Optical Constants in Amorphous Ta2O5 Thin Films as Measured by Spectroscopic Ellipsometry V. A. Shvets
2004
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artikel
222 Uniformity of Optical Constants in Amorphous Ta2O5 Thin Films as Measured by Spectroscopic Ellipsometry Shvets, V. A.
2004
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artikel
223 Using a chromatic-aberration correction system to achieve sub-1.6-nm resolutions of a focused-ion-beam microscope designed for characterization and processing Zhukov, V. A.
2007
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artikel
224 Using the models of incompletely specified Boolean functions in the synthesis of schemes by VHDL descriptions Bibilo, P. N.
2013
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artikel
225 X-ray-Induced Irreversible Changes in the Structure and Electrical Properties of Cd1 xZnxTe E. M. Pashaev
2002
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artikel
226 X-ray-Induced Irreversible Changes in the Structure and Electrical Properties of Cd1 – xZnxTe Pashaev, E. M.
2002
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artikel
                             226 gevonden resultaten
 
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