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                             16 gevonden resultaten
nr titel auteur tijdschrift jaar jaarg. afl. pagina('s) type
1 Atmospheric Pressure Cold Plasma as a Potential Technology to Degrade Carbamate Residues in Water Moutiq, Rkia

40 5 p. 1291-1309
artikel
2 Correction to: Influence of Plasma Treatments on the Hemocompatibility of PET and PET + TiO2 Films Topala, Ionut

40 5 p. 1381
artikel
3 Discussion of the Effect of Shielding Gas and Conductivity of Vapor Core on Metal Transfer Phenomena in Gas Metal Arc Welding by Numerical Simulation Ogino, Yosuke

40 5 p. 1109-1126
artikel
4 Efficient Degradation of Styrene in a Nonthermal Plasma–Catalytic System Over Pd/ZSM-5 Catalyst Nguyen, Van Toan

40 5 p. 1207-1220
artikel
5 High H-atom Density in R(He,Ar)/x%(N2–5%H2) Early Afterglows Ricard, André

40 5 p. 1351-1363
artikel
6 H2S Decomposition into H2 and S2 by Plasma Technology: Comparison of Gliding Arc and Microwave Plasma Zhang, Quan-Zhi

40 5 p. 1163-1187
artikel
7 Influence of Electrode Interval and Barrier Thickness in the Segmented Electrode Micro-plasma DBD Reactor on CO2 Decomposition Wang, Baowei

40 5 p. 1189-1206
artikel
8 Laser Induced Dielectric Breakdown for Chemical Vapor Deposition by Hydrogen Reduction of Volatile Boron Halides BCl3 and BF3 Gornushkin, I. B.

40 5 p. 1145-1162
artikel
9 Localized Electric Field Enhanced Streamer Cold Plasma Interaction on Biological Curved Surfaces and Its Shadow Effect Srisonphan, Siwapon

40 5 p. 1253-1265
artikel
10 Novel insight at the Effect of Cold Atmospheric Pressure Plasma on the Activity of Enzymes Essential for the Germination of Pea (Pisum sativum L. cv. Prophet) Seeds Švubová, Renáta

40 5 p. 1221-1240
artikel
11 Numerical and Experimental Investigation on the Effects of a Nozzle Attachment to Plasma Torches for Plasma Atomization Yurtkuran, Emre

40 5 p. 1127-1144
artikel
12 Optimization of TiO2 Mesoporous Photoanodes Prepared by Inkjet Printing and Low-Temperature Plasma Processing Homola, Tomáš

40 5 p. 1311-1330
artikel
13 Parametric Study of Plasma Characteristics and Carbon Nanofibers Growth in PECVD System: Numerical Modeling Gupta, Ravi

40 5 p. 1331-1350
artikel
14 Plasma Parameters and Silicon Etching Kinetics in C4F8 + O2 + Ar Gas Mixture: Effect of Component Mixing Ratios Lee, Byung Jun

40 5 p. 1365-1380
artikel
15 Relative Potential of Different Plasma Forming Gases in Degradation of Rhodamine B Dye by Microplasma Treatment and Evaluation of Reuse Prospectus for Treated Water as Liquid Fertilizer Meiyazhagan, S.

40 5 p. 1267-1290
artikel
16 Residual Layer Removal of Technical Glass Resulting from Reactive Atmospheric Plasma Jet Etching by Pulsed Laser Irradiation Kazemi, Faezeh

40 5 p. 1241-1251
artikel
                             16 gevonden resultaten
 
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